TRANSPARENT CONDUCTIVE FILMS

• US 20100045610A1
• Filed: 08/20/2008
• Published: 02/25/2010
• Est. Priority Date: 08/20/2008
• Status: Abandoned Application

• Current Assignee: SNU R&DB Foundation (Seoul National University)
• Original Assignee: SNU R&DB Foundation (Seoul National University)
• Inventors: Sung, Moon Gyu, Hong, Seunghun
• Application Number:
  US12/195,356
• Publication Number:
  US 20100045610A1
• Time in Patent Office: Days
• US Class Current: 345/173
• CPC Class Codes: G06F 3/045 using resistive elements, e.g. a single continuous surface or two parallel surfaces put in contact
• CPC Class Codes: H01B 1/04 mainly consisting of carbon-silicon compounds, carbon or silicon
• CPC Class Codes: H01B 1/08 oxides

Abstract

A transparent conductive film comprised of a carbon nanotube network and indium tin oxide composite and a method for manufacturing the transparent conductive film are provided.

Claims

1. A transparent conductive film, comprising a carbon nanotube network and an indium tin oxide composite.

2. The transparent conductive film of claim 1, wherein the carbon nanotube network and indium tin oxide composite comprise a carbon nanotube network layer and an indium tin oxide layer disposed on the carbon nanotube network.

3. The transparent conductive film of claim 2, wherein the carbon nanotube network layer comprises a metallic single walled carbon nanotube network layer.

4. The transparent conductive film of claim 2, wherein the carbon nanotube network layer comprises a metallic multi walled carbon nanotube network layer.

5. A method for manufacturing a transparent conductive film comprised of a carbon nanotube network and indium tin oxide composite, wherein the method comprises:

providing a transparent substrate;

disposing a metallic type carbon nanotube solution onto the transparent substrate;

forming a metallic carbon nanotube network layer from the metallic carbon nanotube solution; and

disposing an indium tin oxide layer over the metallic carbon nanotube network layer.

6. The method for manufacturing the transparent conductive film of claim 5, wherein the forming the metallic carbon nanotube network layer comprises utilizing at least one of laser ablation, carbon arc or chemical vapor deposition (CVD).

7. The method for manufacturing the transparent conductive film of claim 5, wherein the disposing the metallic carbon nanotube solution comprises dispersing carbon nanotube powder in a solvent to make a carbon nanotube solution and isolating the metallic carbon nanotube solution from the carbon nanotube solution.

8. The method for manufacturing the transparent conductive film of claim 5, wherein the disposing metallic carbon nanotube solution comprises disposing a metallic single walled carbon nanotube solution.

9. The method for manufacturing the transparent conductive film of claim 5, wherein the disposing the metallic carbon nanotube solution comprises disposing a metallic multi walled carbon nanotube solution.

10. The method for manufacturing the transparent conductive film of claim 7, wherein the isolating the carbon nanotube solution comprises utilizing a density-gradient ultracentrifugation technique using a structure discriminating surfactant.

11. The method for manufacturing the transparent conductive film of claim 5, wherein the disposing of the metallic carbon nanotube solution onto the transparent substrate comprises disposing at least one of spray coating or dip coating techniques.

12. The method for manufacturing the transparent conductive film of claim 5, wherein the disposing of the indium tin oxide layer comprises utilizing at least one of via sputtering or chemical vapor deposition techniques.

13. The method for manufacturing the transparent conductive film of claim 5, further comprising:

repeating the disposing of the metallic carbon nanotube solution and the disposing of the indium tin oxide layer on top of the metallic carbon nanotube layer, alternately, one or more times.

14. The method for manufacturing the transparent conductive film of claim 5, further comprising annealing the transparent conductive film.

15. A touch screen, comprising:

a transparent substrate;

a first transparent conductive film disposed on the transparent substrate;

a second transparent conductive film disposed opposite to the first transparent conductive film; and

an air gap layer disposed between the first and the second transparent conductive films,

wherein the first and the second transparent conductive films are composite films including a carbon nanotube network and indium tin oxide composite.

16. The touch screen of claim 15, wherein a plurality of dot spacers is placed in the air gap layer to maintain the space between the first and the second transparent conductive films.