SEMICONDUCTOR MANUFACTURING APPARATUS AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
First Claim
1. A semiconductor manufacturing apparatus that forms a carbon film on a wafer by plasma enhanced chemical vapor deposition, comprising:
- a body having a top opening;
a stage provided within the body for placement of the wafer;
a showerhead that encloses the top opening and that introduces a deposition gas or an etch gas; and
a gas delivery system including a central gas inlet that introduces gas toward a central portion of the wafer from a central portion of the showerhead, and a peripheral gas inlet that introduces gas toward a bevel of the wafer from an outer peripheral portion of the showerhead,wherein the gas delivery system, after activating the etch gas outside the body, delivers the activated etch gas toward the bevel of the wafer to selectively remove a portion of the carbon film formed on the bevel of the wafer.
1 Assignment
0 Petitions
Accused Products
Abstract
A semiconductor manufacturing apparatus that forms a carbon film on a wafer by plasma enhanced chemical vapor deposition includes a body having a top opening; a stage provided within the body for placement of the wafer; a showerhead that encloses the top opening and that introduces a deposition gas or an etch gas; and a gas delivery system including a central gas inlet that introduces gas toward a central portion of the wafer from a central portion of the showerhead, and a peripheral gas inlet that introduces gas toward a bevel of the wafer from an outer peripheral portion of the showerhead, wherein the gas delivery system, after activating the etch gas outside the body, delivers the activated etch gas toward the bevel of the wafer to selectively remove a portion of the carbon film formed on the bevel of the wafer.
-
Citations
20 Claims
-
1. A semiconductor manufacturing apparatus that forms a carbon film on a wafer by plasma enhanced chemical vapor deposition, comprising:
-
a body having a top opening; a stage provided within the body for placement of the wafer; a showerhead that encloses the top opening and that introduces a deposition gas or an etch gas; and a gas delivery system including a central gas inlet that introduces gas toward a central portion of the wafer from a central portion of the showerhead, and a peripheral gas inlet that introduces gas toward a bevel of the wafer from an outer peripheral portion of the showerhead, wherein the gas delivery system, after activating the etch gas outside the body, delivers the activated etch gas toward the bevel of the wafer to selectively remove a portion of the carbon film formed on the bevel of the wafer. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13)
-
-
14. A method of manufacturing a semiconductor device in which a carbon film formation with plasma enhanced chemical vapor deposition is performed, comprising:
-
forming the carbon film on a wafer by introducing a deposition gas from a central gas inlet positioned at a central portion of a showerhead and a peripheral gas inlet positioned at a peripheral portion of the showerhead, the showerhead enclosing an upper opening of a body of a plasma enhanced chemical vapor deposition apparatus, and etching away the carbon film formed on a bevel of the wafer by delivering a first etch gas activated outside the body toward the bevel of the wafer from the peripheral gas inlet. - View Dependent Claims (15, 16, 17, 18, 19, 20)
-
Specification