×

COMPOSITE MATERIAL FOR IMPLANTABLE DEVICE

  • US 20100049024A1
  • Filed: 10/30/2009
  • Published: 02/25/2010
  • Est. Priority Date: 01/12/2004
  • Status: Abandoned Application
First Claim
Patent Images

1. A method for forming a composite material suitable for implantation in a host, the method comprising:

  • providing a matrix material having a first dielectric constant;

    providing a plurality of hollow gas-filled beads having a second dielectric constant, wherein the second dielectric constant is lower than the first dielectric constant;

    mixing the hollow gas-filled beads and the matrix material to obtain a mixture; and

    curing the mixture, whereby a composite material with a third dielectric constant is formed, wherein the third dielectric constant is lower than the first dielectric constant and higher than the second dielectric constant.

View all claims
  • 1 Assignment
Timeline View
Assignment View
    ×
    ×