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FILM DEPOSITION APPARATUS AND SUBSTRATE PROCESSING APPARATUS

  • US 20100050943A1
  • Filed: 08/31/2009
  • Published: 03/04/2010
  • Est. Priority Date: 09/04/2008
  • Status: Active Grant
First Claim
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1. A film deposition apparatus for depositing a thin film on a substrate in a vacuum chamber by sequentially supplying at least two kinds of source gases that contains a first reaction gas and a second reaction gas and by carrying out a supply cycle to sequentially supply said at least two kinds of source gases, the film deposition apparatus comprising:

  • a turntable rotatably provided in the chamber and having a substrate placement part on which a substrate is placed;

    a first reaction gas supply part and a second reaction gas supply part each of which extends from one of positions different from each other on a circumferential edge of said turntable toward a rotation center of said turntable in order to supply said first reaction gas and said second reaction gas, respectively;

    a first separation gas supply part extending from a position on the circumferential edge of said turntable between said first reaction gas supply part and said second reaction gas supply part toward the rotation center of said turntable in order to supply a first separation gas for separating said first reaction gas and said second reaction gas from each other;

    a first bottom surface area defined in a bottom surface of a ceiling plate of said vacuum chamber and containing said first reaction gas supply part, the first bottom surface area provided at a first height from said turntable;

    a first space formed between said first bottom surface area and said turntable;

    a second bottom surface area defined in the bottom surface of said ceiling plate of said vacuum chamber and containing said second reaction gas supply part, the second bottom surface area provided at a position separate from said first bottom surface area and at a second height from said turntable;

    a second space formed between said second bottom surface area and said turntable;

    a third bottom surface area defined in the bottom surface of said ceiling plate and containing said first separation gas supply part, said third bottom surface area positioned on both sides of said first separation gas supply part along a rotating direction of said turntable, said third bottom surface area provided at a third height from said turntable lower than said first height and said second height;

    a thin third space formed between said third bottom surface area and said turntable and having said third height so that said first separation gas supplied from said first separation gas supply part flows into said first space and said second space;

    a central part area defined in the bottom surface of said ceiling plate, said central part area being provided with a second separation gas supply part on a side of said substrate placement part with respect to the rotation center of said turntable, said second supply part supplying a second separation gas for separating said first reaction gas and said second reaction gas from each other;

    an exhaust port configured to exhaust said first reaction gas and said second reaction gas together with said first separation gas discharged to both sides of said third space and said second separation gas discharged from said central part area; and

    a motor provided under a rotation shaft of said turntable to rotate said turntable,wherein said rotation shaft of said turntable is coupled to a drive shaft of said motor without slip.

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