SEMICONDUCTOR DEVICE WITH A TRENCH GATE STRUCTURE AND METHOD FOR THE PRODUCTION THEREOF
First Claim
1. A semiconductor device comprising:
- a semiconductor body with two switching electrodes;
at least one gate electrode, wherein the at least one gate electrode controls the off state and the on state between the switching electrodes;
a trench gate structure by which the at least one gate electrode controls at least one vertical switching channel through at least one body zone; and
wherein the trench gate structure includes at least one trench with side walls and wherein the at least one trench accommodates the at least one gate electrode, which is insulated in the region of the at least one body zone against the side walls alternately by at least one gate oxide section and at least one trench oxide section, and which forms a switching channel with a gate oxide section in the at least one region.
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Accused Products
Abstract
A semiconductor device with a trench gate structure includes a semiconductor body with switching electrodes. At least gate electrode controls the off state and the on state between the switching electrodes. The at least one gate electrode in the trench gate structure controls at least one vertical switching channel through at least one body zone. The trench gate structure includes at least one trench with side walls, wherein the at least one gate electrode, which is insulated against the side walls in the region of the at least one body zone alternately by at least one gate oxide section and at least one trench oxide section and forms a switching channel with a gate oxide section in the at least one region, is located in the at least one trench.
41 Citations
21 Claims
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1. A semiconductor device comprising:
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a semiconductor body with two switching electrodes; at least one gate electrode, wherein the at least one gate electrode controls the off state and the on state between the switching electrodes; a trench gate structure by which the at least one gate electrode controls at least one vertical switching channel through at least one body zone; and wherein the trench gate structure includes at least one trench with side walls and wherein the at least one trench accommodates the at least one gate electrode, which is insulated in the region of the at least one body zone against the side walls alternately by at least one gate oxide section and at least one trench oxide section, and which forms a switching channel with a gate oxide section in the at least one region. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11)
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12. A semiconductor device comprising:
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a semiconductor body with switching electrodes; a gate electrode, wherein the at least one gate electrode controls the off state and the on state between the switching electrodes; a trench gate structure by which the at least one gate electrode controls at least one vertical switching channel through at least one body zone; and wherein the trench gate structure includes at least one trench with side walls and wherein the at least one trench accommodates the at least one gate electrode, which is insulated in the region of the at least one body zone against the side walls alternately by at least one gate oxide section and at least one trench oxide section, and which forms a switching channel with a gate oxide section in the at least one region. wherein the trench gate structure includes strip-shaped parallel trenches. - View Dependent Claims (13, 14, 15)
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16. A method for the production of a semiconductor device with a trench gate structure, comprising:
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following completing a trench structure with trench walls and trench bases, applying a first insulating layer thicker than a gate dielectric to the trench walls and trench bases; etching sections of the trench walls and trench bases and applying a gate dielectric to the exposed sections; filling the trench structure with a gate electrode, sections of which are modulated in their width by the varying insulation thickness; completing the semiconductor device with first and second switching electrodes and a trench gate structure.
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17. A semiconductor device comprising:
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a semiconductor body with switching electrodes; a gate electrode, wherein the gate electrode controls the off state and the on state between the switching electrodes; a trench gate structure by which the gate electrode controls a vertical switching channel through a body zone; and wherein the trench gate structure includes a trench with side walls and wherein the trench accommodates the gate electrode, insulated in the region of the body zone against the side walls alternately by a gate oxide section and a trench oxide section, and which forms a switching channel with a gate oxide section in the at least one region. - View Dependent Claims (18, 19, 20, 21)
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Specification