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PHOTOMASK INSPECTION METHOD, SEMICONDUCTOR DEVICE INSPECTION METHOD, AND PATTERN INSPECTION APPARATUS

  • US 20100054577A1
  • Filed: 07/31/2009
  • Published: 03/04/2010
  • Est. Priority Date: 09/04/2008
  • Status: Active Grant
First Claim
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1. A photomask inspection method inspecting a plurality of photomasks used to manufacture the same semiconductor device, each of the photomasks including a plurality of mutually replaceable unit regions set therein, the method comprising:

  • inspecting one of the photomasks to detect a defect; and

    determining whether or not the detected defect includes a redundancy defect positioned in one of the unit regions replaceable with another of the unit regions to remedy the one of the photomasks,one of the unit regions not being inspected when inspecting one of the photomasks in the case where the one of the unit regions includes a coordinate of the redundancy defect detected in another of the photomasks inspected previously.

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