COATING INSTALLATION COMPRISING A RADIO DEVICE AND METHOD FOR CONTROLLING AN ACTUATOR OR A HEATER

• US 20100055296A1
• Filed: 11/26/2007
• Published: 03/04/2010
• Est. Priority Date: 11/29/2006
• Status: Abandoned Application

• Current Assignee: Leica Biosystems Nussloch GmbH (Danaher Corporation), Joachim Bankmann
• Original Assignee: Leica Microsystems CMS GmbH (Danaher Corporation)
• Inventors: Eisenkrämer, Frank, Bankmann, Joachim
• Application Number:
  US12/517,048
• Publication Number:
  US 20100055296A1
• Time in Patent Office: Days
• US Class Current: 427/8
• CPC Class Codes: C23C 14/505 for rotation of the substrates
• CPC Class Codes: C23C 14/56 Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks

Abstract

A deposition apparatus and methods for controlling an actuator and a heating system in a deposition apparatus are proposed. The deposition apparatus comprises a deposition chamber and at least one substrate holder movably arranged within the deposition chamber for holding substrates to be coated. The deposition apparatus shall further comprise radio equipment having at least a first radio device which is connected to the substrate holder and a second radio device which is arranged at least partially outside the deposition chamber. Between the first radio device and the second radio device a radio link is to be established at least temporarily for transferring information.

Claims

1. A deposition apparatus comprising:

a deposition chamber;

at least one substrate holder movably arranged within the deposition chamber for holding substrates to be coated;

radio equipment having at least;

a first radio device which is connected to the substrate holder, and

a second radio device which is arranged at least partially outside the deposition chamber; and

a radio link for transferring information being established at least temporarily between the first radio device and the second radio device.

2. The deposition apparatus according to claim 1, wherein at least one actuator is connected to a first radio device and said actuator is in operative connection with the first radio device and is connected to the substrate holder.

3. The deposition apparatus according to claim 2, wherein the information includes control commands for the actuator.

4. The deposition apparatus according to claim 3, wherein the actuator controls at least one shield connected to the substrate holder for interrupting a material flow coming from a material source arranged within the deposition chamber.

5. The deposition apparatus according to claim 3, wherein the actuator effects turning of at least one substrate.

6. The deposition apparatus according to claim 5, wherein at least parts of the substrate holder can be turned by almost 180°

by means of the actuator.

7. The deposition apparatus according to claim 6, wherein at least parts of the substrate holder can be turned about an axis and are supported relative to the reference frame without the use of an axle by means of at least one spring twisted substantially coaxially to the axis.

8. The deposition apparatus according to claim 7, wherein at least parts of the substrate holder are biased relative to the reference frame by means of the at least one twisted spring, and the 180°

turn of at least parts of the substrate holder is effected while reducing the bias of the at least one twisted spring.

9. The deposition apparatus according to claim 1, wherein at least one heating system is connected to the first radio device and said heating system is in operative connection with the first radio device and is connected to the substrate holder.

10. The deposition apparatus according to claim 9, wherein the information includes control commands for the heating system.

11. The deposition apparatus according to claim 2, wherein the first radio device is connected to a measuring device that is in operative connection with the first radio device and is connected to the substrate holder.

12. The deposition apparatus according to claim 11, wherein the measuring device is suitable for measuring at least one physical quantity from a group of physical quantities comprising a substrate temperature, a gas pressure, an electrical voltage, an electrical resistance, or a layer thickness of a layer deposited on a substrate to be coated.

13. The deposition apparatus according to claim 12, wherein at least one physical quantity is a control parameter of at least one of the actuators and the heating system.

14. The deposition apparatus according to claim 11, wherein at least one of the group consisting of the first radio device, the actuator and the measuring device are equipped with means for thermal insulation.

15. The deposition apparatus according to claim 11, wherein at least one of the group consisting of the first radio device, the actuator and the measuring device are accommodated in a vacuum-insulated housing.

16. The deposition apparatus according to claim 11, wherein at least one of the group consisting of the first radio device, the actuator and the measuring device are accommodated in a common housing.

17. The deposition apparatus according to claim 1, wherein the substrate holder is designed as a spherical cap rotatable about an axis.

18. The deposition apparatus according to claim 1, wherein in the deposition chamber a planetary gear rotatable about a main axis is arranged, which planetary gear is suitable for rotating at least the substrate holder connected to the planetary gear about an axis which is oriented substantially parallel to the main axis.

19. The deposition apparatus according to claim 1, wherein the carrier frequency of the radio link is an ISM frequency.

20. The deposition apparatus according to claim 19, wherein the carrier frequency is one of the frequency group consisting of 27 MHz, 40 MHz, 446 MHz, 860 MHz and 2.45 GHz.

21. The deposition apparatus according to claim 1, wherein the radio link is a digital radio link.

22. The deposition apparatus according to claim 1, wherein the deposition chamber is one of the group consisting of a vacuum chamber, a high vacuum chamber and an ultrahigh vacuum chamber.

23. The deposition apparatus according to claim 1, wherein the substrates are to be coated with a thin layer having a layer thickness of one of the range group consisting of between 3 nm to 100 μ

m and 50 nm to 15 μ

m.

24. The deposition apparatus according to claim 1, wherein the substrates are to be coated with a material which includes at least a material component from a group of material components consisting of SiO2, TiO2, HfO, TaO, MgF2, Al2O3, ZrO2, PrTiO3, and ZnS.

25. The deposition apparatus according to claim 1, wherein the substrates are to be coated with a metallic material.

26. The deposition apparatus according to claim 1, wherein the substrates are to be coated with a multi-layer system of various materials.

27. A method for controlling an actuator in a deposition apparatus, the deposition apparatus comprising:

a deposition chamber;

at least one substrate holder movably arranged within the deposition chamber for holding substrates to be coated;

radio equipment having at least;

a first radio device which is connected to the substrate holder, and

a second radio device which is arranged at least partially outside the deposition chamber; and

a radio link for transferring information being established at least temporarily between the first radio device and the second radio device;

said method comprising the following steps;

recording at least one measured value by means of a measuring device which is connected to the substrate holder;

transferring the at least one measured value via a radio link established at least temporarily between the first radio device and the second radio device;

processing the at least one measured value in a data processing unit connected to the second radio device into at least one control command; and

transferring the at least one control command via the radio link established at least temporarily between the second radio device and the first radio device to the actuator.

28. A method for controlling a heating system in a deposition apparatus, the deposition apparatus comprising:

at least one deposition chamber;

at least one substrate holder movably arranged within the deposition chamber for holding substrates to be coated;

radio equipment having at least;

a first radio device which is connected to the substrate holder, and

a second radio device which is arranged at least partially outside the deposition chamber; and

a radio link for transferring information being established at least temporarily between the first radio device and the second radio device;

said method comprising the following steps;

recording at least one measured value by means of a measuring device which is connected to the substrate holder;

transferring the at least one measured value via a radio link established at least temporarily between the first radio device and the second radio device;

processing the at least one measured value in a data processing unit connected to the second radio device into at least one control command; and

transferring the at least one control command via the radio link established at least temporarily between the second radio device and the first radio device to the heating system.