FILM DEPOSITION APPARATUS, SUBSTRATE PROCESSING APPARATUS, FILM DEPOSITION METHOD, AND COMPUTER-READABLE STORAGE MEDIUM FOR FILM DEPOSITION METHOD
First Claim
1. A film deposition apparatus for depositing a film on a substrate by carrying out a cycle of alternately supplying at least two kinds of reaction gases that react with each other to the substrate to produce a layer of a reaction product in a chamber, the film deposition apparatus comprising:
- a rotation table provided in the chamber, the rotation table having a substrate receiving area for mounting the substrate thereon;
a first reaction gas supplying part configured to supply a first reaction gas to one surface of the rotation table on which the substrate receiving area is provided;
a second reaction gas supplying part configured to supply a second reaction gas to the one surface, the second reaction gas supplying part being separated from the first reaction gas supplying part along a circumferential direction of the rotation table;
a separation area located along the circumferential direction between a first process area to which the first reaction gas is supplied and a second process area to which the second reaction gas is supplied, the separation area including a separation gas supplying part from which a separation gas is supplied;
a first evacuation channel having an evacuation port between the first process area and the separation area;
a second evacuation channel having an evacuation port between the second process area and the separation area;
a first evacuation part connected to the first evacuation channel via a first valve;
a second evacuation part connected to the second evacuation channel via a second valve;
a first pressure detecting part interposed between the first valve and the first evacuation part;
a second pressure detecting part interposed between the second valve and the second evacuation part;
a process pressure detecting part provided in at least one of the first and second valves; and
a control part configured to output a control signal for controlling opening of the first and second valves based on a pressure detection value detected from each of the first and second pressure detecting parts so that each of the pressure inside the chamber and the flow ratio between the gases flowing in the first and second evacuation channels becomes a predetermined value, respectively.
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Accused Products
Abstract
There is disclosed a film deposition apparatus and a film deposition method for depositing a film on a substrate by carrying out cycles of supplying in turn at least two source gases to the substrate in order to form a layer of a reaction product, and a computer readable storage medium storing a computer program for causing the film deposition apparatus to carry out the film deposition method.
152 Citations
48 Claims
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1. A film deposition apparatus for depositing a film on a substrate by carrying out a cycle of alternately supplying at least two kinds of reaction gases that react with each other to the substrate to produce a layer of a reaction product in a chamber, the film deposition apparatus comprising:
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a rotation table provided in the chamber, the rotation table having a substrate receiving area for mounting the substrate thereon; a first reaction gas supplying part configured to supply a first reaction gas to one surface of the rotation table on which the substrate receiving area is provided; a second reaction gas supplying part configured to supply a second reaction gas to the one surface, the second reaction gas supplying part being separated from the first reaction gas supplying part along a circumferential direction of the rotation table; a separation area located along the circumferential direction between a first process area to which the first reaction gas is supplied and a second process area to which the second reaction gas is supplied, the separation area including a separation gas supplying part from which a separation gas is supplied; a first evacuation channel having an evacuation port between the first process area and the separation area; a second evacuation channel having an evacuation port between the second process area and the separation area; a first evacuation part connected to the first evacuation channel via a first valve; a second evacuation part connected to the second evacuation channel via a second valve; a first pressure detecting part interposed between the first valve and the first evacuation part; a second pressure detecting part interposed between the second valve and the second evacuation part; a process pressure detecting part provided in at least one of the first and second valves; and a control part configured to output a control signal for controlling opening of the first and second valves based on a pressure detection value detected from each of the first and second pressure detecting parts so that each of the pressure inside the chamber and the flow ratio between the gases flowing in the first and second evacuation channels becomes a predetermined value, respectively. - View Dependent Claims (2, 3, 4, 5, 6, 14, 15, 16, 17, 18)
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7. A film deposition apparatus for depositing a film on a substrate by carrying out a cycle of alternately supplying at least two kinds of reaction gases that react with each other to the substrate to produce a layer of a reaction product in a chamber, the film deposition apparatus comprising:
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a rotation table provided in the chamber, the rotation table having a substrate receiving area for mounting the substrate thereon; a first reaction gas supplying part configured to supply a first reaction gas to one surface of the rotation table on which the substrate receiving area is provided; a second reaction gas supplying part configured to supply a second reaction gas to the one surface, the second reaction gas supplying part being separated from the first reaction gas supplying part along a circumferential direction of the rotation table; a separation area located along the circumferential direction between a first process area to which the first reaction gas is supplied and a second process area to which the second reaction gas is supplied, the separation area including a separation gas supplying part from which a separation gas is supplied; a first evacuation channel having an evacuation port between the first process area and the separation area; a second evacuation channel having an evacuation port between the second process area and the separation area; a first evacuation part connected to the first evacuation channel via a first valve; a second evacuation part connected to the second evacuation channel via a second valve; a first process pressure detecting part interposed between the first valve and the first evacuation part; a second process pressure detecting part interposed between the second valve and the second evacuation part; and a control part configured to output a control signal for controlling opening of the first and second valves based on a pressure detection value detected from each of the first and second pressure detecting parts so that each of the pressure inside the chamber and the pressure difference between the first and second process areas becomes a predetermined value, respectively. - View Dependent Claims (8, 9, 10, 11, 12, 13)
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19. A film deposition method for depositing a film on a substrate by carrying out a cycle of alternately supplying at least two kinds of reaction gases that react with each other to the substrate to produce a layer of a reaction product in a chamber, the film deposition method comprising the steps of:
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mounting the substrate substantially horizontally onto a rotation table provided inside the chamber; rotating the rotation table; supplying a first reaction gas to one surface of the rotation table on which a substrate receiving area is provided, from a first reaction gas supplying part; supplying a second reaction gas to the one surface from a second reaction gas supplying part, the second reaction gas supplying part being separated from the first reaction gas supplying part along a circumferential direction of the rotation table; supplying a separation gas from a separation gas supplying part provided in a separation area located between the first reaction gas supplying part and the second reaction gas supplying part; evacuating the first reaction gas of the first process area from a first evacuation part via a first evacuation channel having an evacuation port between the first process area and the separation area; evacuating the second reaction gas of the second process area from a second evacuation part via a second evacuation channel having an evacuation port between the second process area and the separation area; and detecting the pressure inside the chamber, a first pressure between a first valve of the first evacuation channel and the first evacuation part, and a second pressure between a second valve of the second evacuation channel and the second evacuation port; and adjusting opening of the first and second valves based on pressure detection values detected in the detecting step so that each of the pressure inside the chamber and the flow ratio between the gases flowing in the first and second evacuation channels becomes a predetermined value, respectively. - View Dependent Claims (20, 21, 22, 23, 24, 32, 33, 34, 35)
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25. A film deposition method for depositing a film on a substrate by carrying out a cycle of alternately supplying at least two kinds of reaction gases that react with each other to the substrate to produce a layer of a reaction product in a chamber, the film deposition method comprising the steps of:
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mounting the substrate substantially horizontally onto a rotation table provided inside the chamber; rotating the rotation table; supplying a first reaction gas to one surface of the rotation table on which a substrate receiving area is provided, from a first reaction gas supplying part; supplying a second reaction gas to the one surface from a second reaction gas supplying part, the second reaction gas supplying part being separated from the first reaction gas supplying part along a circumferential direction of the rotation table; supplying a separation gas from a separation gas supplying part provided in a separation area located between the first reaction gas supplying part and the second reaction gas supplying part; evacuating the first process area from a first evacuation part via a first evacuation channel having an evacuation port between the first process area and the separation area; evacuating the second process area from a second evacuation part via a second evacuation channel having an evacuation port between the second process area and the separation area; detecting a first pressure between a first valve of the first evacuation channel and the first evacuation part and a second pressure between a second valve of the second evacuation channel and the second evacuation port; and adjusting opening of the first and second valves based on pressure detection values detected in the detecting step so that each of the pressure inside the chamber and the pressure difference between the first process area and the second process area becomes a predetermined value, respectively. - View Dependent Claims (26, 27, 28, 29, 30, 31)
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36. A computer-readable storage-medium on which a program used for a film deposition apparatus for depositing a film on a substrate by carrying out a cycle of alternately supplying at least two kinds of reaction gases that react with each other to the substrate to produce a layer of a reaction product in a chamber, the program causing the film deposition apparatus to perform a film deposition method comprising the steps of:
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mounting the substrate substantially horizontally onto a rotation table provided inside the chamber; rotating the rotation table; supplying a first reaction gas to one surface of the rotation table on which a substrate receiving area is provided, from a first reaction gas supplying part; supplying a second reaction gas to the one surface from a second reaction gas supplying part, the second reaction gas supplying part being separated from the first reaction gas supplying part along a circumferential direction of the rotation table; supplying a separation gas from a separation gas supplying part provided in a separation area located between the first reaction gas supplying part and the second reaction gas supplying part; evacuating the first reaction gas of the first process area from a first evacuation part via a first evacuation channel having an evacuation port between the first process area and the separation area; evacuating the second reaction gas of the second process area from a second evacuation part via a second evacuation channel having an evacuation port between the second process area and the separation area; and detecting the pressure inside the chamber, a first pressure between a first valve of the first evacuation channel and the first evacuation part, and a second pressure between a second valve of the second evacuation channel and the second evacuation port; and adjusting opening of the first and second valves based on pressure detection values detected in the detecting step so that each of the pressure inside the chamber and the flow ratio between the gases flowing in the first and second evacuation channels becomes predetermined value, respectively.
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37. A film deposition apparatus for depositing a film on a substrate by carrying out a cycle of alternately supplying at least two kinds of reaction gases that react with each other to the substrate to produce a layer of a reaction product in a chamber, the film deposition apparatus comprising:
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a rotation table provided in the chamber, the rotation table having a substrate receiving area for mounting the substrate thereon; a first reaction gas supplying part configured to supply a first reaction gas to one surface of the rotation table on which the substrate receiving area is provided; a second reaction gas supplying part configured to supply a second reaction gas to the one surfacer the second reaction gas supplying part being separated from the first reaction gas supplying part along a circumferential direction of the rotation table; a separation area located along the circumferential direction between a first process area to which the first reaction gas is supplied and a second process area to which the second reaction gas is supplied, the separation area including a separation gas supplying part from which a separation gas is supplied; a ceiling surface located on both sides of the separation gas supplying part relative to a rotation direction for forming a narrow space between the rotation table and the ceiling surface for allowing the separation gas to flow from the separation area to the first and second process areas; a center portion area located at a center part of the chamber, the center portion area having an electing port for ejecting the separation gas to the one surface of the rotation table; a first evacuation channel having an evacuation port between the first process area and the separation area; a second evacuation channel having an evacuation port between the second process area and the separation area; a first evacuation part connected to the first evacuation channel; and a second evacuation part connected to the second evacuation channel. - View Dependent Claims (38, 39, 40, 41, 42, 43, 44, 45)
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46. A film deposition method for depositing a film on a substrate by carrying out a cycle of alternately supplying at least two kinds of reaction gases that react with each other to the substrate to produce a layer of a reaction product in a chamber, the film deposition method comprising the steps of:
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mounting the substrate substantially horizontally onto a rotation table provided inside the chamber; rotating the rotation table; supplying a first reaction gas to one surface of the rotation table on which a substrate receiving area is provided, from a first reaction gas supplying part; supplying a second reaction gas to the one surface from a second reaction gas supplying part, the second reaction gas supplying part being separated from the first reaction gas supplying part along a circumferential direction of the rotation table; supplying a separation gas from a separation gas supplying part provided in a separation area located between the first reaction gas supplying part and the second reaction gas supplying part; diffusing the separation gas in a narrow space between the rotation table and a ceiling surface provided on both sides of the separation gas supplying part in a manner facing the rotation table by supplying the separation gas from the separation gas supplying part provided in the separation area between the first and second reaction gas supplying parts; ejecting the separation gas to the one surface of the rotation table from an ejection port formed in a center portion area located at a center part of the chamber; evacuating the separation gas and the first reaction gas from the first process area and evacuating the separation gas and the second reaction gas from the second process area by evacuating the separation gas and the first reaction gas via a first evacuation channel having an evacuation port between the first process area and the separation area and evacuating the separation gas and the second reaction gas via a second evacuation channel having an evacuation port between the second process area and the separation area; evacuating the separation gas and the first reaction gas from a first evacuation part connected to the first evacuation channel; and evacuating the separation gas and the second reaction gas from a second evacuation part connected to the second evacuation channel.
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47. The film deposition method as claimed in claim in 46, wherein the step of evacuating the separation gas and the first reaction gas from the first process area and evacuating the separation gas and the second reaction gas from the second process area includes a step of evacuating the atmospheres of the first and second process areas from the evacuation ports of the first and second evacuation channels provided below the rotation table via a gap between a circumferential edge of the rotation table and an inner circumferential edge of the chamber.
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48. The film deposition method as claimed in claim in 46, further comprising a step of:
separately detoxifying ejected matter ejected from the first and second evacuation parts with first and second detoxifying units.
Specification