FILM DEPOSITION APPARATUS, SUBSTRATE PROCESSING APPARATUS, FILM DEPOSITION METHOD, AND COMPUTER-READABLE STORAGE MEDIUM
First Claim
1. A film deposition apparatus which deposits a thin film on a substrate by performing a cycle of alternately supplying at least two kinds of source gases, including a first reactive gas and a second reactive gas, to produce a layer of a reaction product in a vacuum chamber, comprising:
- a turntable that is rotatably arranged in the vacuum chamber and includes a substrate mounting part on which the substrate is mounted;
first and second reactive gas supplying portions that are arranged to extend from mutually different circumferential positions of the turntable to a center of rotation of the turntable to respectively supply the first reactive gas and the second reactive gas;
a first separation gas supplying portion that is arranged to extend from a circumferential position of the turntable between the first reactive gas supplying portion and the second reactive gas supplying portion to the center of rotation to supply a first separation gas that separates the first reactive gas and the second reactive gas;
a first undersurface area in an undersurface of a top plate of the vacuum chamber which area is arranged at a first height from the turntable to include the first reactive gas supplying portion;
a first space that is arranged between the first undersurface area and the turntable;
a second undersurface area in an undersurface of the top plate which area is arranged at a position apart from the first undersurface area and at a second height from the turntable to include the second reactive gas supplying portion;
a second space that is arranged between the second undersurface area and the turntable;
a third undersurface area in an undersurface of the top plate which area is arranged at a third height from the turntable to include the first separation gas supplying portion, the third height smaller than the first height and the second height, and the third undersurface area extending on both sides of the first separation gas supplying portion along a rotational direction of the turntable;
a third space that is arranged between the third undersurface area and the turntable, the third space having the third height from the turntable and allowing the first separation gas supplied from the first separation gas supplying portion to flow into the first space and the second space;
a position detecting unit that detects a rotation position of the turntable;
a detection part that is arranged at a circumferential position of the turntable and detected by the position detecting unit;
a core area in an undersurface of the top plate, the core area including a second separation gas supplying portion arranged on a side of the substrate mounting part around the center of rotation of the turntable to supply a second separation gas which separates the first reactive gas and the second reactive gas; and
an exhaust port that is arranged to exhaust the first reactive gas and the second reactive gas together with both the first separation gas discharged to both sides of the third space and the second separation gas discharged from the core area.
1 Assignment
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Accused Products
Abstract
In a film deposition apparatus which deposits a thin film on a substrate by supplying first and second reactive gases in a vacuum chamber, there are provided a turntable, a first reactive gas supplying portion and a second reactive gas supplying portion which are arranged to extend from circumferential positions of the turntable to a center of rotation of the turntable, a first separation gas supplying portion arranged between the first and second reactive gas supplying portions, a first space having a first height and including the first separation gas supplying portion, a second space having a second height and including the second reactive gas supplying portion, a third space having a height lower than the first height and the second height and including the first separation gas supplying portion, a position detecting unit detecting a rotation position of the turntable, and a detection part arranged at a circumferential portion of the turntable and detected by the position detecting unit.
459 Citations
20 Claims
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1. A film deposition apparatus which deposits a thin film on a substrate by performing a cycle of alternately supplying at least two kinds of source gases, including a first reactive gas and a second reactive gas, to produce a layer of a reaction product in a vacuum chamber, comprising:
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a turntable that is rotatably arranged in the vacuum chamber and includes a substrate mounting part on which the substrate is mounted; first and second reactive gas supplying portions that are arranged to extend from mutually different circumferential positions of the turntable to a center of rotation of the turntable to respectively supply the first reactive gas and the second reactive gas; a first separation gas supplying portion that is arranged to extend from a circumferential position of the turntable between the first reactive gas supplying portion and the second reactive gas supplying portion to the center of rotation to supply a first separation gas that separates the first reactive gas and the second reactive gas; a first undersurface area in an undersurface of a top plate of the vacuum chamber which area is arranged at a first height from the turntable to include the first reactive gas supplying portion; a first space that is arranged between the first undersurface area and the turntable; a second undersurface area in an undersurface of the top plate which area is arranged at a position apart from the first undersurface area and at a second height from the turntable to include the second reactive gas supplying portion; a second space that is arranged between the second undersurface area and the turntable; a third undersurface area in an undersurface of the top plate which area is arranged at a third height from the turntable to include the first separation gas supplying portion, the third height smaller than the first height and the second height, and the third undersurface area extending on both sides of the first separation gas supplying portion along a rotational direction of the turntable; a third space that is arranged between the third undersurface area and the turntable, the third space having the third height from the turntable and allowing the first separation gas supplied from the first separation gas supplying portion to flow into the first space and the second space; a position detecting unit that detects a rotation position of the turntable; a detection part that is arranged at a circumferential position of the turntable and detected by the position detecting unit; a core area in an undersurface of the top plate, the core area including a second separation gas supplying portion arranged on a side of the substrate mounting part around the center of rotation of the turntable to supply a second separation gas which separates the first reactive gas and the second reactive gas; and an exhaust port that is arranged to exhaust the first reactive gas and the second reactive gas together with both the first separation gas discharged to both sides of the third space and the second separation gas discharged from the core area. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18)
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19. A film deposition method which deposits a thin film on a substrate by performing a cycle of alternately supplying at least two kinds of source gases, including a first reactive gas and a second reactive gas, to produce a layer of a reaction product in a vacuum chamber, wherein a height of an area, to which a first separation gas that separates the first reactive gas and the second reactive gas is supplied, between an upper surface of a turntable and a top plate of the turntable on which the substrate is placed is lower than a height of an area, to which the first reactive gas and the second reaction gas are supplied, between the turntable upper surface and the top plate, and wherein the first separation gas is supplied to a narrow space arranged between the turntable upper surface and the top plate, a second separation gas that separates the first reactive gas and the second reactive gas is supplied to a core area in an undersurface of the top plate around a center of rotation of the turntable, and the first reactive gas and the second reactive gas which are separated from each other are exhausted together with the first separation gas and the second separation gas, the film deposition method comprising:
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correcting a rotation position of the turntable; placing the substrate on the turntable the rotation position of which is corrected; rotating the turntable on which the substrate is placed; depositing a thin film on a surface of the substrate by repeating a cycle of heating the turntable from a bottom of the turntable, supplying the first reactive gas and the second reactive gas respectively from a first reactive gas supplying portion and a second reactive gas supplying portion, which are arranged at mutually different circumferential positions of the turntable, supplying the first separation gas from a first separation gas supplying portion arranged between the first reactive gas supplying portion and the second reactive gas supplying portion, moving the substrate while the turntable is rotated, supplying the first reactive gas to the surface of the substrate, stopping the supply of the first reactive gas, supplying the second reactive gas to the surface of the substrate, and stopping the supply of the second reactive gas; and taking out the substrate from the turntable the rotation position of which is corrected. - View Dependent Claims (20)
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Specification