Scanner Based Optical Proximity Correction System and Method of Use
First Claim
Patent Images
1. A modeling method, comprising:
- inputting tool parameters into a model;
inputting basic model parameters into the model;
generating a simulated, corrected reticle design using the tool parameters and the basic model parameters;
comparing an image of test patterns against the simulated, corrected reticle design;
determining whether model vs. exposure difference (δ
1) is less than predetermined criteria (ε
1); and
completing the model when the model vs. exposure difference is less than the predetermined criteria.
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Abstract
A modeling technique is provided. The modeling technique includes inputting tool parameters into a model and inputting basic model parameters into the model. The technique further includes generating a simulated, corrected reticle design using the tool parameters and the basic model parameters. An image of test patterns is compared against the simulated, corrected reticle design. A determination is made as to whether δ1<ε-1, wherein δ1 represents model vs. exposure difference and ε-1 represents predetermined criteria. The technique further includes completing the model when δ1<ε-1.
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Citations
35 Claims
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1. A modeling method, comprising:
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inputting tool parameters into a model; inputting basic model parameters into the model; generating a simulated, corrected reticle design using the tool parameters and the basic model parameters; comparing an image of test patterns against the simulated, corrected reticle design; determining whether model vs. exposure difference (δ
1) is less than predetermined criteria (ε
1); andcompleting the model when the model vs. exposure difference is less than the predetermined criteria. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11)
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12. A system for deploying an application for modeling a design layout, comprising:
a computer infrastructure operable to; generate a simulated, corrected reticle design using tool parameters and basic model parameters; compare an image of test patterns against the simulated, corrected reticle design; compare model vs. exposure difference with predetermined criteria; and complete the model when the model vs. exposure difference is less than the predetermined criteria. - View Dependent Claims (13, 14, 15, 16, 17, 18, 19)
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20. An exposure apparatus, comprising at least one module configured to:
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generate a simulated, corrected reticle design using tool parameters and basic model parameters; compare an image of test patterns against the simulated, corrected reticle design; compare model vs. exposure difference with predetermined criteria; and complete the model when the model vs. exposure difference is less than the predetermined criteria. - View Dependent Claims (21, 22, 23)
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24. A method of providing a model, comprising:
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generating a simulated, corrected reticle design using tool parameters and basic model parameters; comparing an image of test patterns against the simulated, corrected reticle design; iteratively comparing model vs. exposure difference and predetermined criteria; and changing at least one of tool parameters and basic model parameters until the model vs. exposure difference is less than the predetermined criteria in the comparing.
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25. A computer program product comprising a computer usable medium having readable program code embodied in the medium, the computer program product includes at least one component to:
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generate a simulated, corrected reticle design using tool parameters and basic model parameters; and iteratively changing at least one of the tool parameters and basic model parameters and compare model vs. exposure difference with predetermined criteria until the model vs. exposure difference is less than the predetermined criteria. - View Dependent Claims (26, 27, 28)
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29. A method, comprising:
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modifying a simulated reticle design using basic model parameters and tool parameters of a predetermined projection tool; creating reticle design data which represents a design of layouts to be imaged for the semiconductor device; and creating a mask set by comparing the simulated reticle design and the reticle design data. - View Dependent Claims (30, 31, 32)
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33. An OPC design process, comprising:
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providing scanner parameters of a predetermined projection tool to a software provider; importing the scanner parameters into a software product for making a design of reticles; and providing the software to a semiconductor device maker for use in the design of the reticles. - View Dependent Claims (34, 35)
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Specification