ILLUMINATION SYSTEM FOR ILLUMINATING A MASK IN A MICROLITHOGRAPHIC EXPOSURE APPARATUS

• US 20100060873A1
• Filed: 07/31/2009
• Published: 03/11/2010
• Est. Priority Date: 04/25/2007
• Status: Active Grant

• Current Assignee: CARL Zeiss SMT GmbH (Carl-Zeiss-Stiftung)
• Original Assignee: Carl Zeiss AG (Carl-Zeiss-Stiftung)
• Inventors: Deguenther, Markus, Fischer, Juergen, Graeupner, Paul
• Granted Patent: US 8,416,390 B2
• Time in Patent Office: Days
• US Class Current: 355/66
• CPC Class Codes: G03F 7/70116 Off-axis setting using a programmable means, e.g. liquid crystal display [LCD], digital micromirror device [DMD] or pupil facets
• CPC Class Codes: G03F 7/70158 Diffractive optical elements
• CPC Class Codes: G03F 7/70216 Mask projection systems

Abstract

An illumination system for illuminating a mask in a microlithographic exposure apparatus has an optical axis and a pupil surface. The system can include an array of reflective or transparent beam deflection elements such as mirrors. Each deflection element can be adapted to deflect an impinging light ray by a deflection angle that is variable in response to a control signal. The beam deflection elements can be arranged in a first plane. The system can further include an optical raster element, which includes a plurality of microlenses and/or diffractive structures. The beam deflection elements), which can be arranged in a first plane, and the optical raster element, which can be arranged in a second plane, can commonly produce a two-dimensional far field intensity distribution. An optical imaging system can optically conjugate the first plane to the second plane.

Claims

1. An illumination system having an optical axis and a pupil surface, the illumination system comprising:

an array comprising deflection elements, each deflection element being reflective or transparent, each deflection element configured to deflect an impinging light ray by a deflection angle that can be varied, and the deflection elements being at least substantially arranged in a first plane;

an optical raster element comprising a plurality of microlenses and/or diffractive structures, the optical raster element being arranged in an second plane, the array and the optical raster element being configured to commonly produce a two-dimensional far field intensity distribution; and

an optical imaging system that optically conjugates the first plane to the second plane,

wherein the illumination system is configured to illuminate a mask in a microlithography exposure apparatus.

2. The illumination system of claim 1, wherein the two-dimensional far field intensity distribution is a convolution of a far field intensity distribution produced by the array and a far field intensity distribution produced by the optical raster element.

3. The illumination system of claim 1, wherein the optical raster element comprises a plurality of zones, wherein each zone is, by optical conjugation produced by the optical imaging system, associated with at least one beam deflection element of the array, and wherein at least two zones produce different far field intensity distributions.

4. The illumination system of claim 1, wherein each beam deflection element is configured to be either in a first state or in a second state, a light beam deflected by a beam deflection element passes the pupil surface when the beam deflection element is in the first state, a light ray deflected by the beam deflection element does not pass through the pupil surface when the beam deflection element is in the second state.

5. The illumination system of claim 4, wherein the optical raster element comprises a plurality of zones, wherein each zone is, by optical conjugation produced by the optical imaging system, associated with at least one beam deflection element of the array, wherein at least two zones produce different far field intensity distributions, the far field intensity distributions produced by the plurality of zones is determined such that a usable area of the pupil surface is at least substantially illuminated if all beam deflection elements are in the first state.

6. The illumination system of claim 5, wherein the far field intensity distributions produced by the plurality of zones is determined such that at least 70% of the usable area of the pupil surface is illuminated if all beam deflection elements are in the first state.

7. The illumination system of claim 3, wherein the at least two zones each produce a far field intensity distribution that has at least substantially the shape of a polygon having n corners, with n≠

4.

8. The illumination system of claim 7, wherein the polygons have different angular orientations.

9. The illumination system of claim 3, wherein a first set of the plurality of zones produces a far field intensity distribution that is a first set of regular hexagons, and a different set of the plurality of zones produces a far field intensity distribution that is a second regular hexagons rotated by 30°

relative to the first set of hexagons.

10. The illumination system of claim 1, wherein the first plane is an object plane of the optical imaging system, and the second plane is an image plane of the optical imaging system.

11. The illumination system of claim 1, wherein the second plane is an object plane of the optical imaging system, and the first plane is an image plane of the optical imaging system.

12. The illumination system of claim 1, wherein the optical imaging system comprises an at least substantially plane folding mirror.

13. The illumination system of claim 1, further comprising a pupil forming condenser configured to establish a Fourier relationship between the image plane and the pupil surface.

14. The illumination system of claim 13, wherein the pupil forming condenser comprises a zoom optical system having a variable focal length.

15. The illumination system of claim 13, wherein the pupil forming condenser comprises an axicon system configured to radially redistribute light propagating therethrough.

16. The illumination system of claim 15, wherein the axicon system comprises a pair of axicon elements, each of the axicon elements having a conical optical surface and a drive mechanism configured to adjust a distance between the axicon elements along the optical axis.

17. The illumination system of claim 1, further comprising a fly'"'"'s eye optical integrator arranged in or in close proximity to the pupil surface.

18. The illumination system of claim 1, further comprising a field forming condenser configured to establish a Fourier relationship between the pupil surface and a field plane of the illumination system.

19. The illumination system of claim 18, further comprising a field stop arranged in the field plane of the illumination system.

20. The illumination system of claim 19, further comprising a field stop objective configured to image the field plane onto a mask plane.

21. The illumination system of claim 1, wherein the first plane is arranged obliquely with respect to the optical axis.

22. The illumination system claim 1, wherein the beam deflection elements are mirrors.

23. The illumination system of claim 22, wherein the mirrors are tiltable by two tilt axes forming an angle therebetween.

24. The illumination system of claim 23, wherein the angle is 90°

.

25. The illumination system of claim 22, wherein the array comprises less than 100 individual mirrors.

26. The illumination system of claim 22, wherein the array comprises less than 50 individual mirrors.

27. The illumination system of claim 1, wherein the beam deflection elements are electro-optical or acousto-optical elements.

28. The illumination system of claim 1, further comprising an exchange holder that can exchangeably receives the optical raster element.

38. An apparatus, comprising:

an illumination system according to claim 1; and

a projection objective,

wherein the apparatus is a microlithography exposure apparatus.

29. An illumination system, comprising:

an array comprising deflection elements, each de-flection element being reflective or transparent, each beam deflection element being configured to deflect an impinging light ray by a deflection angle that can be varied, a first beam deflection element supporting a first diffractive structure, a second beam deflection element supporting a second diffractive structure,

wherein the first diffractive structure and the second diffractive structure are configured to produce different far field intensity distributions, and the illumination system is configured to illuminate a mask in a microlithography exposure apparatus.

30. The illumination system claim 29, wherein the far field intensity distributions produced by the first diffractive structure and the second diffractive structure have at least substantially the shape of polygons.

31. The illumination system of claim 30, wherein the polygons have n corners with n≠

4.

32. The illumination system of claim 29, wherein the far field intensity distributions produced by the first diffractive structure and the second diffractive structure differ with respect to their angular orientations.

33. The illumination system of claim 29, wherein at least one beam deflection element is mounted so that it has three rotational degrees of freedom.

34. The illumination system of claim 29, wherein at least one beam deflection element is coupled to an actuator that is configured to deform the at least one beam deflection element.

35. An illumination system, comprising:

an array comprising deflection elements, each de-flection element being reflective or transparent, each beam deflection element is configured to deflect an impinging light ray by a deflection angle that can be varied, and at least one deflection element is curved in a rotationally asymmetric manner and/or supports a diffractive structure to produce a rotationally asymmetric far field intensity distribution,

wherein the at least one beam deflection element is mounted such that it has three rotational degrees of freedom, and the illumination system is configured to illuminate a mask in a microlithography exposure apparatus.

36. The illumination system of claim 35, wherein two rotational degrees of freedom are associated with tilt axes which are parallel to a plane, and a third rotational degree of freedom is associated with a rotational axis that intersects the plane.

37. The illumination system of claim 36, wherein the rotational axis forms an intersection angle with the plane between 50°

and 90°

.