Automated Metal Pattern Generation for Integrated Circuits
First Claim
1. A metal pattern generated by a computer aided design (CAD) software tool, the metal pattern comprising:
- a first group of metal lines capable of coupling to a first voltage; and
a second group of metal lines capable of coupling to a second voltage; and
a set of fixed metal tabs at predetermined positions; and
a first subset of metal tabs selected from a first set of selectable metal tabs at predetermined positions, each first set metal tab coupling a said fixed metal tab to a said first group metal line; and
a second subset of metal tabs selected from a second set of selectable metal tabs at predetermined positions, each second set metal tab coupling a said fixed metal tab to a said second group metal line;
wherein, the first and second subsets are selected by computer readable code having instructions to;
read a binary data set, each data point in the set uniquely matched to a said fixed metal tab; and
select a first or second set metal tab based on a first or second data value respectively for each fixed metal tab.
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Accused Products
Abstract
An integrated circuit fabricated by a mask set including a mask to generate a metal pattern defined by CAD software, the metal pattern generation method including: reading a binary data set, the data points in the set uniquely matched to a plurality of fixed metal tabs; and selecting a metal tab from a first set of selectable metal tabs for a first data value, or a second set of selectable metal tabs for a second data value for each of the fixed metal tabs; wherein a first set metal tab and a second set metal tab couples each said fixed metal tab to first and second voltages respectively.
47 Citations
20 Claims
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1. A metal pattern generated by a computer aided design (CAD) software tool, the metal pattern comprising:
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a first group of metal lines capable of coupling to a first voltage; and a second group of metal lines capable of coupling to a second voltage; and a set of fixed metal tabs at predetermined positions; and a first subset of metal tabs selected from a first set of selectable metal tabs at predetermined positions, each first set metal tab coupling a said fixed metal tab to a said first group metal line; and a second subset of metal tabs selected from a second set of selectable metal tabs at predetermined positions, each second set metal tab coupling a said fixed metal tab to a said second group metal line; wherein, the first and second subsets are selected by computer readable code having instructions to; read a binary data set, each data point in the set uniquely matched to a said fixed metal tab; and select a first or second set metal tab based on a first or second data value respectively for each fixed metal tab. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8)
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9. A method for defining a metal pattern for an integrated circuit, comprising:
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positioning fixed metal tabs at predetermined positions; and positioning fixed metal lines at predetermined positions, a first portion of the metal lines capable of coupling to a first voltage and a second portion of the metal lines capable of coupling to a second voltage; and positioning selectable metal tabs, a first portion of selectable tabs coupling the fixed metal tabs to the first portion of metal lines, and the second portion of metal tabs coupling the fixed metal tabs to the second portion of metal lines, wherein each said fixed metal tab has selectable metal tabs to couple it to said first voltage and said second voltage; and selecting a subset of the selectable metal tabs with a computer by; reading a binary data set, each data point in the set uniquely matched to a said fixed metal tab; and selecting a first or second portion of selectable metal tabs based on a first or second data value respectively for each said fixed metal tab, whereby each said fixed metal tab is either coupled to said first voltage or said second voltage by the selected metal tab. - View Dependent Claims (10, 11, 12, 13, 14, 15, 16)
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17. An integrated circuit fabricated by a mask set including a mask to generate a metal pattern defined by computer aided design (CAD) software, the device comprising:
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a plurality of circuit blocks including a programmable logic block; a plurality of via nodes coupled to the programmable logic block to program the logic block; and a metal pattern comprising; a plurality of fixed metal tabs, each fixed tab covering a said via node to couple to the via node; and a first subset of metal tabs selected from a first set of metal tabs at predetermined positions, each first set metal tab coupling a said fixed metal tab to a first voltage; and a second subset of metal tabs selected from a second set of metal tabs at predetermined positions, each second set metal tab coupling a said fixed metal tab to a second voltage; wherein, the first and second subsets of metal tabs are selected by the CAD software, and wherein the CAD software includes computer readable instructions for; reading a binary data set, each data point in the set uniquely matched to a said via node; and selecting a first set selectable metal tab for a first data value, or a second set selectable metal tab for a second data value at each said via node. - View Dependent Claims (18, 19, 20)
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Specification