Thin film transistor and method of manufacturing the same
First Claim
Patent Images
1. A thin film transistor (TFT), comprising:
- a gate insulating layer on a gate;
a crystallized channel on a portion of the gate insulating layer corresponding to the gate;
a metal material on a surface of the channel, wherein the metal material crystallizes the channel; and
a source and a drain contacting side surfaces of the channel.
1 Assignment
0 Petitions
Accused Products
Abstract
A thin film transistor (TFT) and a method of manufacturing the same are provided, the TFT including a gate insulating layer on a gate. A channel may be formed on a portion of the gate insulating layer corresponding to the gate. A metal material may be formed on a surface of the channel. The metal material crystallizes the channel. A source and a drain may contact side surfaces of the channel.
14 Citations
20 Claims
-
1. A thin film transistor (TFT), comprising:
-
a gate insulating layer on a gate; a crystallized channel on a portion of the gate insulating layer corresponding to the gate; a metal material on a surface of the channel, wherein the metal material crystallizes the channel; and a source and a drain contacting side surfaces of the channel. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8)
-
-
9. A method of manufacturing an oxide TFT, comprising:
-
forming a gate on a substrate; forming a gate insulating layer on the substrate and the gate; depositing a metal material on the gate insulating layer; coating a channel material on the metal material; annealing the coated metal material such that a channel is formed; coating a conductive material on the channel; and etching the coated conductive material until a surface of the channel is exposed. - View Dependent Claims (10, 11, 12, 13, 14, 15, 16, 17)
-
-
18. A method of manufacturing an oxide TFT, comprising:
-
forming a gate on a substrate; forming a gate insulating layer on the substrate and the gate; depositing a metal material on the gate insulating layer; coating a channel material on the metal material; forming a channel from the channel material, wherein the metal material diffuses to an upper surface of the channel; coating a conductive material on the channel; and etching the coated conductive material until the upper surface of the channel is exposed. - View Dependent Claims (19, 20)
-
Specification