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PHOTOMASK BLANK, PHOTOMASK, AND METHODS OF MANUFACTURING THE SAME

  • US 20100075236A1
  • Filed: 09/18/2009
  • Published: 03/25/2010
  • Est. Priority Date: 09/19/2008
  • Status: Active Grant
First Claim
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1. A photomask blank for fabricating a phase shift mask having a light-transmissive substrate provided with a phase shift part adapted to give a predetermined phase difference to transmitted exposure tight,wherein said phase shift part is a dug-down part formed by digging down said light-transmissive substrate from a surface thereof to a digging depth adapted to produce the predetermined phase difference with respect to exposure light transmitted through said light-transmissive substrate at a portion where said phase shift part is not provided,said photomask blank comprising:

  • a tight-shielding part formed in a peripheral area around a transfer pattern area of the surface of said light-transmissive substrate and adapted to shield exposure light; and

    an etching mask film formed in the transfer pattern area of the surface of said light-transmissive substrate and made of a material being substantially dry-etchable with a chlorine-based gas, but not substantially dry-etchable with a fluorine-based gas, said etching mask film serving as an etching mask at least until said digging depth is reached when forming said dug-down part.

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