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Variable Resist Protecting Groups

  • US 20100075238A1
  • Filed: 09/16/2009
  • Published: 03/25/2010
  • Est. Priority Date: 09/19/2008
  • Status: Active Grant
First Claim
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1. A method of patterning a substrate using a dual-tone development procedure, comprising:

  • forming a layer of radiation-sensitive material on the substrate, wherein the layer of radiation-sensitive material comprises a resist material having a polymer backbone and a plurality of protecting groups;

    creating a first patterned layer of exposed radiation-sensitive material by exposing the layer of radiation-sensitive material using a first EM radiation and a reticle having a plurality of masking features, and heating the first patterned layer of exposed radiation-sensitive material thereby creating a plurality of high exposure regions having a first number of de-protected groups, a plurality of medium exposure regions having a second number of de-protected groups, and a plurality of low exposure regions having a third number of de-protected groups in the low exposure regions;

    determining a first threshold profile for a first positive tone development procedure for the first patterned layer of exposed radiation-sensitive material using at least one of the first number of de-protected groups in the high exposure regions, the second number of de-protected groups in the medium exposure regions, and the third number of de-protected groups in the low exposure regions;

    determining a first set of limits for a first dual-tone development procedure;

    modifying the first threshold profile if the first threshold profile exceeds one or more of the first set of limits; and

    developing the first patterned layer of exposed radiation-sensitive material if the first threshold profile does not exceed at least one of the first set of limits.

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