New Cleaning, Descaling and Disinfecting Composition for Dialysis Generators

• US 20100076082A1
• Filed: 04/12/2007
• Published: 03/25/2010
• Est. Priority Date: 04/12/2007
• Status: Abandoned Application

• Current Assignee: Bioxal
• Original Assignee: Bioxal
• Inventors: Gamet, Jean-Claude, Pierre, Marie-Pierre, Le Rouzic, Daniel, Mabille, Jean-Benoit
• Application Number:
  US12/595,186
• Publication Number:
  US 20100076082A1
• Time in Patent Office: Days
• US Class Current: 514/557
• CPC Class Codes: A01N 2300/00 Combinations or mixtures of active ingredients covered by classes A01N27/00 - A01N65/48 with other active or formulation relevant ingredients, e.g. specific carrier materials or surfactants, covered by classes A01N25/00 - A01N65/48
• CPC Class Codes: A01N 25/30 characterised by the surfactants
• CPC Class Codes: A01N 33/24 only one oxygen atom attached to the nitrogen atom
• CPC Class Codes: A01N 37/02 Saturated carboxylic acids or thio analogues thereof; Derivatives thereof
• CPC Class Codes: A01N 37/16 containing the group; Thio analogues thereof
• CPC Class Codes: A01N 59/00 Biocides, pest repellants or attractants, or plant growth regulators containing elements or inorganic compounds
• CPC Class Codes: A61L 2/186 Peroxide solutions
• CPC Class Codes: A61L 2202/17 Combination with washing or cleaning means
• CPC Class Codes: A61L 2202/24 Medical instruments, e.g. endoscopes, catheters, sharps
• CPC Class Codes: A61M 1/169 using chemical substances
• CPC Class Codes: A61M 2205/84 for treating several patients simultaneously
• CPC Class Codes: C11D 1/75 Amino oxides
• CPC Class Codes: C11D 1/825 Mixtures of compounds all of which are non-ionic
• CPC Class Codes: C11D 3/042 Acids
• CPC Class Codes: C11D 3/2079 Monocarboxylic acids-salts thereof
• CPC Class Codes: C11D 3/3947 Liquid compositions

Abstract

Composition comprising, per 100% of its mass, essentially: from 0.50% by mass to 1.50% by mass of peracetic acid, from 3.00% by mass to 15.00% by mass of hydrogen peroxide, from 3.00% by mass to 15.00% by mass of acetic acid, from 0.10% by mass to 1.00% by mass of concentrated nitric acid, from 0.001% by mass to 0.20% by mass of nonionic surfactant, from 0.01% by mass to 0.10% by mass of amine oxide, from 0.01% by mass to 0.20% by mass of stabilizer, and water to make up to 100% by mass; use thereof for cleaning, descaling and disinfecting dialysis equipment between two successive dialysis sessions, without additional treatment other than rinsing of said dialysis equipment with osmosed water; methods for the use thereof.

Claims

1-8. -8. (canceled)

9. A composition comprising, per 100% of its mass:

from 0.50 wt % to 1.50 wt % of peracetic acid;

from 3.00 wt % to 15.00 wt % of hydrogen peroxide;

from 3.00 wt % to 15.00 wt % of acetic acid;

from 0.10 wt % to 1.00 wt % of concentrated nitric acid;

from 0.001 wt % to 0.20 wt % of non-ionic surfactant;

from 0.01 wt % to 0.10 wt % of amine oxide;

from 0.01 wt % to 0.20 wt % of stabilizer; and

water to make it up to 100 wt %.

10. The composition of claim 9, wherein the composition comprises, per 100% of its mass:

the peracetic acid is present in an amount from 0.50 wt % to 1.00 wt %;

the hydrogen peroxide is present from 4.00 wt % to 10.00 wt %;

the acetic acid is present from 4.00 wt % to 15.00 wt %;

the concentrated nitric acid is present in an amount from 0.10 wt % to 1.00 wt %;

the non-ionic surfactant is present in an amount from 0.03 wt % to 0.10 wt %;

the amine oxide is present in an amount from 0.01 wt % to 0.10 wt %;

the stabilizer is present in an amount from 0.03 wt % to 0.10 wt %; and

the remaining amount up to 100 wt % is water.

11. The composition of claim 10, wherein the composition comprises, per 100% of its mass:

the peracetic acid is present in an amount from 0.70 wt % to 1.00 wt %;

the hydrogen peroxide is present in an amount from 4.00 wt % to 7.00 wt %;

the acetic acid is present in an amount from 7.00 wt % to 12.00 wt %;

the concentrated nitric acid is present in an amount from 0.20 wt % to 0.70 wt %;

the non-ionic surfactant is present in an amount from 0.03 wt % to 0.075 wt %;

the amine oxide is present in an amount from 0.01 wt % to 0.05 wt %;

the stabilizer is present in an amount from 0.03 wt % to 0.075 wt %; and

the remaining amount up to 100 wt % is water.

12. A method for preparing a composition comprising, per 100% of its mass:

from 0.50 wt % to 1.50 wt % of peracetic acid;

from 3.00 wt % to 15.00 wt % of hydrogen peroxide;

from 3.00 wt % to 15.00 wt % of acetic acid;

from 0.10 wt % to 1.00 wt % of concentrated nitric acid;

from 0.001 wt % to 0.20 wt % of non-ionic surfactant;

from 0.01 wt % to 0.10 wt % of amine oxide;

from 0.01 wt % to 0.20 wt % of stabilizer; and

water to make it up to 100 wt %;

said method comprising a step of mixing, per 100 wt %, from 3 wt % to 20 wt % of an aqueous solution (A) that comprises from 5 wt % to 30 wt % of peracetic acid, from 10 wt % to 50 wt % of hydrogen peroxide, from 5 wt % to 60 wt % of acetic acid, optionally up to 1% of stabilizer, and water to make the aqueous solution (A) up to 100 wt %, with from 80 vol % to 97 vol % of an aqueous solution (B) prepared by mixing, per 100 wt % from 8 wt % to 10 wt % of acetic acid, from 0.10 wt % to 1 wt % of nitric acid, from 3 wt % to 10 wt % of hydrogen peroxide, from 0.03 wt % to 0.1 wt % of non-ionic surfactant, from 0.01 wt % to 0.1 wt % of amine oxide, from 0.005 wt % to 0.1 wt % of stabilizer; and

water to make the aqueous solution (B) up to 100 wt %.

13. A method of cleaning, descaling and disinfecting the hydraulic circuits of the dialysis generator between two dialysis sessions, wherein the method comprises the steps of:

(a) circulating an aqueous solution obtained by the dilution of a composition comprising, per 100% of its mass;

from 0.50 wt % to 1.50 wt % of peracetic acid;

from 3.00 wt % to 15.00 wt % of hydrogen peroxide;

from 3.00 wt % to 15.00 wt % of acetic acid;

from 0.10 wt % to 1.00 wt % of concentrated nitric acid;

from 0.001 wt % to 0.20 wt % of non-ionic surfactant;

from 0.01 wt % to 0.10 wt % of amine oxide;

from 0.01 wt % to 0.20 wt % of stabilizer; and

water to make it up to 100 wt %,

within the hydraulic circuits of the dialysis generator for a period of time between 10 minutes and 30 minutes, the dilution of the composition being between 1/20 and 1/40 in water osmosed by the generator,

and at the end of step (a);

(b) rinsing for a time between 15 minutes and 60 minutes, the rinsing consisting of the circulation of osmosed water within the hydraulic circuits of the dialysis generator.

14. The method of claim 13, wherein the dilution rate of the aqueous composition used is between 1/25 and 1/35.

15. A method for cleaning, descaling and disinfecting the distribution loop of a water treatment line for hemodialysis, wherein the method comprises the steps of:

(a) circulating an aqueous solution obtained by the dilution of a composition comprising, per 100% of its mass;

from 0.50 wt % to 1.50 wt % of peracetic acid;

from 3.00 wt % to 15.00 wt % of hydrogen peroxide;

from 3.00 wt % to 15.00 wt % of acetic acid;

from 0.10 wt % to 1.00 wt % of concentrated nitric acid;

from 0.001 wt % to 0.20 wt % of non-ionic surfactant;

from 0.01 wt % to 0.10 wt % of amine oxide;

from 0.01 wt % to 0.20 wt % of stabilizer; and

water to make it up to 100 wt %,

within the distribution loop for a period of time between 30 minutes and 60 minutes, the dilution of the composition being between 1/20 and 1/40 in water,

and at the end of step (a);

(b) rinsing for a time between 30 minutes and 60 minutes, the rinsing consisting of the circulation of osmosed water within the distribution loop.

16. The use of a composition comprising, per 100% of its mass:

from 0.50 wt % to 1.50 wt % of peracetic acid;

from 3.00 wt % to 15.00 wt % of hydrogen peroxide;

from 3.00 wt % to 15.00 wt % of acetic acid;

from 0.10 wt % to 1.00 wt % of concentrated nitric acid;

from 0.001 wt % to 0.20 wt % of non-ionic surfactant;

from 0.01 wt % to 0.10 wt % of amine oxide;

from 0.01 wt % to 0.20 wt % of stabilizer; and

water to make it up to 100 wt %.

for cleaning, descaling and disinfecting dialysis equipment between two successive dialysis sessions, without the need for supplementary treatment other than a rinsing of the dialysis equipment with osmosed water.