DISPLAY DEVICE
First Claim
1. A display device comprising:
- a substrate;
a scan line;
a signal line intersecting with the scan line over the substrate;
a pixel portion in which pixel electrodes are arranged in matrix; and
a first non-linear element provided over the substrate in a region outside the pixel portion,wherein the pixel portion comprises a thin film transistor in which a channel formation region is formed in a first oxide semiconductor layer,wherein the thin film transistor comprises;
a gate electrode which is connected to the scan line;
a first wiring layer which is connected to the signal line and the first oxide semiconductor layer; and
a second wiring layer which is connected to the pixel electrode and the first oxide semiconductor layer,wherein the first non-linear element comprises;
a gate electrode;
a first oxide semiconductor layer formed over the gate electrode of the first non-linear element;
a channel protective layer covering a region which overlaps with a channel formation region of the first oxide semiconductor layer; and
a first wiring layer and a second wiring layer formed over the channel protective layer and the gate electrode of the first non-linear element,wherein the gate electrode of the first non-linear element is connected to the scan line, andwherein one of the first wiring layer and the second wiring layer of the first non-linear element is directly connected to a wiring formed with the same layer as the gate electrode of the first non-linear element.
2 Assignments
0 Petitions
Accused Products
Abstract
In order to take advantage of the properties of a display device including an oxide semiconductor, a protective circuit and the like having appropriate structures and a small occupied area are necessary. The protective circuit is formed using a non-linear element which includes a gate insulating film covering a gate electrode; a first oxide semiconductor layer over the gate insulating film; a channel protective layer covering a region which overlaps with a channel formation region of the first oxide semiconductor layer; and a first wiring layer and a second wiring layer each of which is formed by stacking a conductive layer and a second oxide semiconductor layer and over the first oxide semiconductor layer. The gate electrode is connected to a scan line or a signal line, the first wiring layer or the second wiring layer is directly connected to the gate electrode.
-
Citations
26 Claims
-
1. A display device comprising:
-
a substrate; a scan line; a signal line intersecting with the scan line over the substrate; a pixel portion in which pixel electrodes are arranged in matrix; and a first non-linear element provided over the substrate in a region outside the pixel portion, wherein the pixel portion comprises a thin film transistor in which a channel formation region is formed in a first oxide semiconductor layer, wherein the thin film transistor comprises; a gate electrode which is connected to the scan line; a first wiring layer which is connected to the signal line and the first oxide semiconductor layer; and a second wiring layer which is connected to the pixel electrode and the first oxide semiconductor layer, wherein the first non-linear element comprises; a gate electrode; a first oxide semiconductor layer formed over the gate electrode of the first non-linear element; a channel protective layer covering a region which overlaps with a channel formation region of the first oxide semiconductor layer; and a first wiring layer and a second wiring layer formed over the channel protective layer and the gate electrode of the first non-linear element, wherein the gate electrode of the first non-linear element is connected to the scan line, and wherein one of the first wiring layer and the second wiring layer of the first non-linear element is directly connected to a wiring formed with the same layer as the gate electrode of the first non-linear element. - View Dependent Claims (2, 3, 4, 5, 6, 7)
-
-
8. A display device comprising:
-
a substrate; a scan line; a signal line intersecting with the scan line over the substrate; a pixel portion in which pixel electrodes are arranged in matrix, wherein the pixel portion comprises a thin film transistor in which a channel formation region is formed in a first oxide semiconductor layer; and a first non-linear element provided over the substrate in a region outside the pixel portion, wherein the thin film transistor comprises; a gate electrode which is connected to the scan line; a first wiring layer which is connected to the signal line and the first oxide semiconductor layer, and a second wiring layer which is connected to the pixel electrode and the first oxide semiconductor layer, wherein the first non-linear element comprises; a gate electrode; a first oxide semiconductor layer formed over the gate electrode of the first non-linear element; a channel protective layer covering a region which overlaps with a channel formation region of the first oxide semiconductor layer; and a first wiring layer and a second wiring layer formed over the channel protective layer and the gate electrode of the first non-linear element, wherein the gate electrode of the first non-linear element is connected to the signal line, and wherein one of the first wiring layer and the second wiring layer of the first non-linear element is directly connected to a wiring formed with the same layer as the gate electrode of the first non-linear element. - View Dependent Claims (9, 10, 11, 12, 13)
-
-
14. A display device comprising:
-
a substrate; a scan line; a signal line intersecting with the scan line over the substrate; a pixel portion in which pixel electrodes are arranged in matrix; and a protective circuit comprising a first non-linear element formed over the substrate and in a region outside the pixel portion, wherein the pixel portion comprises a thin film transistor in which a channel formation region is formed in a first oxide semiconductor layer, and wherein the protective circuit connects the scan line and a common wiring or the signal line and a common wiring to each other, wherein the thin film transistor comprises; a gate electrode which is connected to the scan line; a first wiring layer which is connected to the signal line and the first oxide semiconductor layer; and a second wiring layer which is connected to the pixel electrode and the first oxide semiconductor layer; wherein the first non-linear element comprises; a gate electrode; a first oxide semiconductor layer; a channel protective layer covering a region which overlaps with a channel formation region of the first oxide semiconductor layer; and a first wiring layer and a second wiring layer formed over the channel protective layer and the gate electrode of the first non-linear element, wherein the gate electrode of the first non-linear element is connected to the scan line, and wherein one of the first wiring layer and the second wiring layer of the first non-linear element is directly connected to a wiring formed with the same layer as the gate electrode of the first non-linear element. - View Dependent Claims (15, 16, 17, 18, 19, 20)
-
-
21. A display device comprising:
-
a substrate; a scan line; a signal line intersecting with the scan line over the substrate; a pixel portion in which pixel electrodes are arranged in matrix; wherein the pixel portion comprises a thin film transistor in which a channel formation region is formed in a first oxide semiconductor layer; and a protective circuit comprising a first non-linear element formed over the substrate and in a region outside the pixel portion, wherein the protective circuit connects the scan line and a common wiring or the signal line and a common wiring to each other, wherein the thin film transistor comprises; a gate electrode which is connected to the scan line; a first wiring layer which is connected to the signal line and the first oxide semiconductor layer; and a second wiring layer which is connected to the pixel electrode and the first oxide semiconductor layer, wherein the first non-linear element comprises; a gate electrode; a first oxide semiconductor layer; a channel protective layer covering a region which overlaps with a channel formation region of the first oxide semiconductor layer; and a first wiring layer and a second wiring layer formed over the channel protective layer and the gate electrode of the first non-linear element; wherein the gate electrode of the first non-linear element is connected to the signal line, and wherein one of the first wiring layer and the second wiring layer of the first non-linear element is directly connected to a wiring formed with the same layer as the gate electrode of the first non-linear element. - View Dependent Claims (22, 23, 24, 25, 26)
-
Specification