Lithographic Apparatus and Device Manufacturing Method Utilizing a Substrate Handler

• US 20100085553A1
• Filed: 12/16/2009
• Published: 04/08/2010
• Est. Priority Date: 12/23/2004
• Status: Active Grant

• Current Assignee: ASML Netherlands BV (ASML Holding NV)
• Original Assignee: ASML Netherlands BV (ASML Holding NV)
• Inventors: Vosters, Petrus Matthijs Henricus, Luttikhuis, Bernardus Antonius Johannes, Jacobs, Hernes, Van Der Schoot, Harmen Klaas
• Granted Patent: US 8,411,252 B2
• Time in Patent Office: Days
• US Class Current: 355/72
• CPC Class Codes: G03F 7/70691 Handling of masks or workpieces
• CPC Class Codes: G03F 7/70733 Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
• CPC Class Codes: G03F 7/7075 Handling workpieces outside exposure position, e.g. SMIF box
• CPC Class Codes: G03F 7/70791 Large workpieces, e.g. glass substrates for flat panel displays or solar panels

Abstract

A substrate handler is provided. The substrate handler includes a support surface configured to carry a substrate and a pre-conditioning unit configured to pre-condition the substrate. The substrate handler is configured to move the substrate relative to a substrate table.

Claims

1. A substrate handler, comprising:

a support surface configured to carry a substrate; and

a pre-conditioning unit configured to pre-condition the substrate;

wherein the substrate handler is configured to move the substrate relative to a substrate table.

2. The substrate handler of claim 1, wherein:

the pre-conditioning unit comprises a device configured to control a temperature of the substrate; and

the device comprises a heat-exchanging element configured to transfer heat away from or to the substrate.

3. The substrate handler of claim 2, wherein:

the heat-exchanging element comprises a heat exchanging plate arranged to be in thermal contact with the substrate during pre-conditioning; and

the heat exchanging plate comprises at least one channel extending therealong, which heat exchanging plate is configured to heat or cool the substrate by thermal conduction.

4. The substrate handler of claim 2, wherein:

the pre-conditioning unit comprises fluid arranged to flow along the at least one channel, whereby heat is conducted to or away from the substrate; and

the substrate handler is configured to maintain the fluid at a substantially constant temperature.

5. The substrate handler of claim 1, wherein:

the pre-conditioning unit is configured to generate an air film between the plate and the substrate during pre-conditioning; and

the air film serves to transfer heat to or from the substrate.

6. The substrate handler of claim 1, wherein the pre-conditioning unit is one of integrated with or disposed substantially adjacent the substrate handler.

7. A lithographic apparatus, comprising:

a base plate;

a substrate table configured to support a substrate, wherein the base plate is configured to support the substrate table;

a patterning system configured to provide a pattern to a target portion of the substrate; and

a substrate handler configured to move the substrate relative to the substrate table, the substrate handler being positioned substantially over the base plate.

8. The lithographic apparatus of claim 7, further comprising a guide member configured to support a substrate support surface of the substrate handler.

9. The lithographic apparatus of claim 8, wherein:

the substrate support surface is supported on the guide member via at least one guide element that is configured to permit movement in a direction perpendicular to a plane of the substrate table,

in use, the guide element is configured to allow the support surface to move vertically up and down the guide member.

10. The lithographic apparatus of claim 9, wherein the guide element comprises at least one of a roller, a bush, a ball bush, or air bearings.

11. A method comprising:

moving a substrate handler so that a first support surface is substantially aligned in a horizontal plane with a substrate table;

loading a substrate directly from the first support surface of the substrate handler onto the substrate table;

patterning a substrate using the patterning system;

unloading the exposed substrate from the substrate table onto a second support surface of the substrate handler; and

removing the exposed substrate from the second support surface of the substrate handler.

12. The method of claim 11, wherein:

the first support surface of the substrate handler is substantially aligned in the horizontal plane with the substrate table prior to placing the substrate thereupon; and

the second support surface of the substrate handler is substantially aligned in the horizontal plane with the substrate table previous to the exposed substrate being moved thereupon.

13. The method of claim 11, wherein the loading is performed on one side of the patterning system and the unloading is performed substantially simultaneously on the opposite side of the patterning system.

14. A method, comprising:

receiving a substrate on a substrate table supported by a base plate;

patterning a target portion of the substrate; and

moving the substrate relative to the substrate table using a substrate handler, the substrate handler being positioned substantially over the base plate.

15. The method of claim 14, wherein the substrate handler is moved in a vertical direction.

16. The method of claim 14, wherein the substrate table moves relative to the base plate during scanning.

17. A lithographic apparatus, comprising:

a substrate table configured to support a substrate, the substrate table being supported on a base plate and traveling therealong during a scanning operation between a start position and an end position;

a patterning system configured to provide a pattern to a target portion of the substrate, and

a substrate handler configured to move the substrate relative to the substrate table, the substrate handler comprising,

a loading platform disposed on one side of the substrate table above the base plate, and

an unloading platform disposed on an opposite side of the substrate table and to one side of the base plate, at least the loading platform being vertically movable between a raised position above the substrate table and a lowered position in which the unloading platform is substantially aligned in a horizontal plane with the substrate table,

wherein the loading platform is configured to;

load the substrate onto the table if the loading platform is in the lowered position, and

receive the substrate from the substrate table if the loading platform is at an end position after the scanning operation,

wherein both the loading and the unloading platform are substantially level with the substrate table when the substrate table is at the end position so that loading and unloading is configured to be performed substantially simultaneously.

18. A substrate handler, comprising:

a substrate table configured to support a substrate during exposure to a beam of radiation; and

a plurality of platforms, wherein each platform is configured to carry the substrate,

wherein the substrate handler is configured to;

load the substrate onto the substrate table before exposure, and unload the substrate from the substrate table after exposure.

19. The substrate handler of claim 18, wherein a platform of the plurality of platform is configured to carry two or more substrates.