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PLASMA PROCESSING MEMBER, DEPOSITION APPARATUS INCLUDING THE SAME, AND DEPOSITING METHOD USING THE SAME

  • US 20100089320A1
  • Filed: 10/13/2009
  • Published: 04/15/2010
  • Est. Priority Date: 10/13/2008
  • Status: Active Grant
First Claim
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1. A deposition apparatus comprising:

  • a plurality of reaction spaces;

    a plurality of plasma electrodes respectively disposed in the reaction spaces;

    a first plasma processor connected to at least two plasma electrodes; and

    a first plasma power source connected to the first plasma processor.

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