NANO-PATTERNED ACTIVE LAYERS FORMED BY NANO-IMPRINT LITHOGRAPHY
First Claim
Patent Images
1. A device comprising:
- a first electrode;
a first electrically conductive layer formed by nano-imprint lithography and electrically coupled to the first electrode, the first conductive layer defining a multiplicity of protrusions and recesses;
a second electrically conductive layer substantially filling the recesses and covering the protrusions of the first conductive layer;
a second electrode electrically coupled to the second conductive layer; and
a circuit electrically connecting the first electrode and the second electrode.
2 Assignments
0 Petitions
Accused Products
Abstract
Patterned active layers formed by nano-imprint lithography for use in devices such as photovoltaic cells and hybrid solar cells. One such photovoltaic cell includes a first electrode and a first electrically conductive layer electrically coupled to the first electrode. The first conductive layer has a multiplicity of protrusions and recesses formed by a nano-imprint lithography process. A second electrically conductive layer substantially fills the recesses and covers the protrusions of the first conductive layer, and a second electrode is electrically coupled to the second conductive layer. A circuit electrically connects the first electrode and the second electrode.
110 Citations
21 Claims
-
1. A device comprising:
-
a first electrode; a first electrically conductive layer formed by nano-imprint lithography and electrically coupled to the first electrode, the first conductive layer defining a multiplicity of protrusions and recesses; a second electrically conductive layer substantially filling the recesses and covering the protrusions of the first conductive layer; a second electrode electrically coupled to the second conductive layer; and a circuit electrically connecting the first electrode and the second electrode. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10)
-
-
11. A nano-imprint lithography method comprising:
-
forming a first electrically conductive layer with a nano-imprint lithography process, the first conductive layer having a multiplicity of protrusions and recesses; depositing a second electrically conductive layer on the first conductive layer, wherein depositing comprises substantially filling the recesses in the first conductive layer and covering the protrusions in the first conductive layer with the second conductive layer; electrically coupling a first electrode to the first conductive layer; electrically coupling a second electrode to the second conductive layer; and electrically connecting the first electrode and the second electrode. - View Dependent Claims (12, 13, 14, 15, 16, 17, 18, 19, 20)
-
-
21. A nano-imprint lithography method comprising:
-
forming patterned layer on a substrate, the patterned layer comprising a multiplicity of protrusions; electrodepositing a conductive polymer on the patterned layer; and dissolving the patterned layer to yield a conductive layer with a multiplicity of recesses, wherein the recesses are complementary to the protrusions of the patterned layer.
-
Specification