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SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

  • US 20100095981A1
  • Filed: 10/19/2009
  • Published: 04/22/2010
  • Est. Priority Date: 10/21/2008
  • Status: Abandoned Application
First Claim
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1. A substrate processing apparatus to process a substrate by using a first processing liquid including sulfuric acid and a second processing liquid including water, the apparatus comprising:

  • a liquid-film forming device to form a liquid film of the first processing liquid maintained at a temperature higher than room temperature on at least one surface of the substrate; and

    a vapor/mist supply device to supply vapor or mist of the second processing liquid to the surface of the substrate on which the liquid film of the first processing liquid is formed.

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