SPECTROGRAPHIC METROLOGY OF PATTERNED WAFERS

• US 20100103411A1
• Filed: 02/11/2009
• Published: 04/29/2010
• Est. Priority Date: 10/24/2008
• Status: Active Grant

• Current Assignee: Applied Materials Incorporated
• Original Assignee: Applied Materials Incorporated
• Inventors: HOLDEN, JAMES Matthew, Genio, Edgar, Egan, Todd J.
• Granted Patent: US 7,969,568 B2
• Time in Patent Office: Days
• US Class Current: 356/303
• CPC Class Codes: G01J 3/02 Details
• CPC Class Codes: G01J 3/0208 using focussing or collimating elements, e.g. lenses or mirrors; performing aberration correction
• CPC Class Codes: G01J 3/0218 using optical fibers
• CPC Class Codes: G01J 3/0294 Multi-channel spectroscopy
• CPC Class Codes: G01N 21/9501 Semiconductor wafers manufacturing processes per se of semiconductor devices implementing a measuring step H01L22/10
• CPC Class Codes: G01N 21/956 Inspecting patterns on the surface of objects contactless testing of electronic circuits G01R31/308; testing currency G07D; manufacturing processes per se of semiconductor devices implementing a measuring step H01L22/10

Abstract

Light reflected from respective image elements of a workpiece is channeled through respective light channeling elements to respective locations of a spectrographic light disperser. Spectral distributions of the respective image elements produced by the spectrographic light disperser are recorded. A processor groups similar spectral distributions into respective groups of mutually similar distributions, and classifies the groups by the number of distributions contained in each group.

Claims

1. In a workpiece handling chamber, a method of performing on-the-fly spectrographic metrology of a workpiece, comprising:

providing an optical sensor having a field of view coinciding with a path traversed by the workpiece during transfer in the workpiece handling apparatus, and obtaining a still image of the workpiece through said sensor during transfer of said workpiece along said path;

channeling light reflected from respective image elements of said image through respective light channeling elements to respective locations of a spectrographic light disperser;

recording spectral distributions of the respective image elements produced by said spectrographic light disperser;

searching for distributions that are similar to one another and grouping the distributions into groups of mutually similar distributions;

classifying the groups by the number of distributions contained in each group;

selecting at least one of the largest groups and combining the distributions of that group together and providing the combined distribution as the spectral distribution of one region of the integrated circuit; and

processing the combined distribution in accordance with a spectrum analysis process.

2. The method of claim 1 wherein said searching comprises computing a measure of similarity between pairs of said distributions.

3. The method of claim 2 wherein said measure of similarity is one of mean square error, sum of absolute differences, or sum of variances.

4. The method of claim 1 wherein said selecting comprises validating the n largest groups, wherein n is an integer.

5. The method of claim 4 wherein n is at least the approximate number of homogeneous regions of the integrated circuit within a field of view of the sensor.

6. The method of claim 4 further comprising producing an enhanced distribution for each one of said n groups.

7. The method of claim 4 further comprising discarding the distributions of the remaining groups.

8. The method of claim 1 wherein said channeling channels the light to respective locations along a linear slit of said spectrographic light disperser.

9. The method of claim 5 wherein said selecting comprises selecting the largest one of said groups.

10. The method of claim 1 wherein said recording comprises capturing said distributions on a sensor array wherein each said image element corresponds to a column on said sensor array and each wavelength of each distribution corresponds to a row of the respective column.

11. In a workpiece handling chamber, a method of performing spectrographic metrology of a workpiece, comprising:

channeling light reflected from respective image elements on the workpiece through respective light channeling elements to respective locations of a spectrographic light disperser;

recording spectral distributions of the respective image elements produced by said spectrographic light disperser;

searching for distributions that are similar to one another and grouping the distributions into groups of mutually similar distributions;

classifying the groups by the number of distributions contained in each group;

selecting at least one of the largest groups and combining the distributions of that group together and providing the combined distribution as the spectral distribution of one region of the integrated circuit; and

processing the combined distribution in accordance with a spectrum analysis process.

12. The method of claim 11 wherein said searching comprises computing a measure of similarity between pairs of said distributions.

13. The method of claim 12 wherein said measure of similarity is one of mean square error, sum of absolute differences, or sum of variances.

14. The method of claim 11 wherein said selecting comprises validating the n largest groups, wherein n is an integer.

15. The method of claim 14 wherein n is at least the approximate number of homogeneous regions of the integrated circuit within a field of view of the sensor.

16. The method of claim 14 further comprising producing an enhanced distribution for each one of said n groups.

17. The method of claim 14 further comprising discarding the distributions of the remaining groups.

18. The method of claim 11 wherein said channeling channels the light to respective locations along a linear slit of said spectrographic light disperser.

19. The method of claim 11 wherein said selecting comprises selecting the largest one of said groups.

20. The method of claim 11 wherein said recording comprises capturing said distributions on a sensor array wherein each said image element corresponds to a column on said sensor array and each wavelength of each distribution corresponds to a row of the respective column.