SUBSTRATE CLEANING APPARATUS

• US 20100108106A1
• Filed: 02/27/2008
• Published: 05/06/2010
• Est. Priority Date: 03/05/2007
• Status: Abandoned Application

• Current Assignee: Sharp Kabushiki Kaisha (Hon Hai Precision Industry Co., Ltd.), SCREEN Holdings Co., Ltd.
• Original Assignee: Sharp Kabushiki Kaisha (Hon Hai Precision Industry Co., Ltd.), SCREEN Holdings Co., Ltd.
• Inventors: Tanaka, Masato, Hoshi, Norikazu
• Application Number:
  US12/529,875
• Publication Number:
  US 20100108106A1
• Time in Patent Office: Days
• US Class Current: 134/95.100
• CPC Class Codes: B08B 3/04 Cleaning involving contact with liquid
• CPC Class Codes: B08B 3/048 Overflow-type cleaning, e.g. tanks in which the liquid flows over the tank in which the articles are placed
• CPC Class Codes: G02F 1/1303 Apparatus specially adapted to the manufacture of LCDs
• CPC Class Codes: G02F 1/133302 Rigid substrates, e.g. inorganic substrates

Abstract

A chemical solution is mixed to deionized water from a chemical cartridge 29 via a chemical supply unit 27 to produce a treating liquid. Then, the treating liquid is supplied to a treating tank via a supply pipe. The chemical cartridge 29 is not supplemented with the chemical solution through a supplementing line etc., and the chemical solution is not contaminated. As a result, cleanliness of the chemical solution can be kept high, and substrates can be cleaned at a high clean level. Moreover, the chemical cartridge 29 also has a residual quantity display portion 39. Thus a residual quantity of the chemical solution in the chemical cartridge 29 can easily be recognized, and periodic replacement timing of the chemical cartridge 29 can be recognized easily. Furthermore, the chemical cartridge 29 can control the flow rate by a nozzle portion 47. Consequently, the chemical cartridge 29 can directly be attached to the supply pipe, which can simplify the construction and thus can reduce apparatus cost.

Claims

1. A substrate cleaning apparatus for cleaning substrates with a treating liquid containing a chemical solution, comprising:

a treating unit for treating the substrates with the treating liquid;

a supply pipe for supplying deionized water to the treating unit;

a chemical supply unit for supplying the chemical solution to the supply pipe; and

a chemical cartridge for storing the chemical solution and removable from the chemical supply unit.

2. The substrate cleaning apparatus according to claim 1, wherein

the chemical cartridge comprises a controller for controlling a supply flow rate of the chemical solution,;

and

the chemical supply unit comprises an attachment portion to which the chemical cartridge can be attached.

3. The substrate cleaning apparatus according to claim 1, wherein

the chemical supply unit comprises a mixing valve for mixing the chemical solution;

and

the mixing valve comprises a branch pipe through which the chemical solution is supplied, and the branch pipe comprises an attachment portion to which the chemical cartridge can be attached.

4. The substrate cleaning apparatus according to claim 1 any u

the chemical cartridge comprises a residual quantity detecting sensor for detecting a quantity of the chemical solution currently stored inside.

5. The substrate cleaning apparatus according to claim 1, wherein

the chemical cartridge is filled in advance with a hydrochloric acid solution produced by dissolving a hydrogen chloride gas in deionized water.

6. The substrate cleaning apparatus according to claim 1, wherein

the chemical cartridge is filled in advance with an ammonia solution produced by dissolving an ammonia gas in deionized water.

7. The substrate cleaning apparatus according to claim 1, wherein

the chemical cartridge is filled in advance with a hydrofluoric acid solution produced by dissolving a hydrogen fluoride gas in deionized water.

8. The substrate cleaning apparatus according to claim 2, wherein

the chemical cartridge comprises a residual quantity detecting sensor for detecting a quantity of the chemical solution currently stored inside.

9. The substrate cleaning apparatus according to claim 3, wherein

the chemical cartridge comprises a residual quantity detecting sensor for detecting a quantity of the chemical solution currently stored inside.