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Sputtering Target and Oxide Semiconductor Film

  • US 20100108502A1
  • Filed: 11/30/2007
  • Published: 05/06/2010
  • Est. Priority Date: 12/13/2006
  • Status: Active Grant
First Claim
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1. A sputtering target containing oxides of indium (In), gallium (Ga) and zinc (Zn), which comprises a compound shown by ZnGa2O4 and a compound shown by InGaZnO4.

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