Substrate Alignment
First Claim
Patent Images
1. A method, comprising:
- determining location of a first point on an inner edge of a substrate, the inner edge of the substrate positioned about a shaft;
determining an inner diameter of the substrate;
determining a diameter of the shaft;
determining a radius difference between the diameter of the shaft and the inner diameter of the substrate;
biasing the substrate from the first point of the inner edge by the radius difference;
imprinting a patterned layer on the substrate, wherein features of the patterned layer are concentrically imprinted in relation to the shaft.
8 Assignments
0 Petitions
Accused Products
Abstract
Systems and methods for imprinting a patterned layer on a substrate are described. Features of patterned layer may be concentrically imprinted in relation to a shaft positioned on a substrate chuck. The substrate may be biased using a radius difference between a diameter of the shaft and an inner diameter of the substrate in relation to a point on an inner edge of the substrate.
60 Citations
22 Claims
-
1. A method, comprising:
-
determining location of a first point on an inner edge of a substrate, the inner edge of the substrate positioned about a shaft; determining an inner diameter of the substrate; determining a diameter of the shaft; determining a radius difference between the diameter of the shaft and the inner diameter of the substrate; biasing the substrate from the first point of the inner edge by the radius difference; imprinting a patterned layer on the substrate, wherein features of the patterned layer are concentrically imprinted in relation to the shaft. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20)
-
-
21. A method, comprising:
-
determining location of a first point on an inner edge of a substrate, the inner edge of the substrate positioned about a shaft, the shaft including at least two stabilizers providing at least three points of contact relative to the substrate; determining an inner diameter of the substrate; biasing the substrate from the first point of the inner edge such that the first point is adjacent to the shaft; imprinting a patterned layer on the substrate, wherein features of the patterned layer are concentrically imprinted in relation to the shaft.
-
-
22. A method, comprising:
-
determining location of a first point on an inner edge of a substrate, the inner edge of the substrate positioned about a shaft, the shaft including at least two stabilizers providing at least three points of contact relative to the substrate; determining an inner diameter of the substrate with a laser emitter and a photo-electric detector located above the substrate, wherein the photo-electric detector is positioned to receive light diffracted at an angle and provide a signal when a laser is incident on the substrate and the inner diameter of the substrate is determined by a change in the signal; biasing the substrate from the first point of the inner edge such the first point is adjacent to the shaft; imprinting a patterned layer on the substrate, wherein features of the patterned layer are concentrically imprinted in relation to the shaft and are not concentrically imprinted about a center of the substrate.
-
Specification