METHOD OF REDUCING NON-UNIFORMITIES DURING CHEMICAL MECHANICAL POLISHING OF MICROSTRUCTURE DEVICES BY USING CMP PADS IN A GLAZED MODE

• US 20100112816A1
• Filed: 10/08/2009
• Published: 05/06/2010
• Est. Priority Date: 10/31/2008
• Status: Abandoned Application

• Current Assignee: Advanced Micro Devices, Inc.
• Original Assignee: Advanced Micro Devices, Inc.
• Inventors: Schlott, Jana, Marxsen, Gerd, Heinrich, Jens
• Application Number:
  US12/575,996
• Publication Number:
  US 20100112816A1
• Time in Patent Office: Days
• US Class Current: 438/692
• CPC Class Codes: B24B 37/042 operating processes therefor
• CPC Class Codes: B24B 49/00 Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation B24B33/06, B24B37/005 take precedence; if applicable to other machine tools, B23Q15/00 - B23Q17/00 take precedence
• CPC Class Codes: B24B 53/017 Devices or means for dressing, cleaning or otherwise conditioning lapping tools
• CPC Class Codes: H01L 21/3212 by chemical mechanical polishing [CMP]
• CPC Class Codes: H01L 21/7684 Smoothing; Planarisation

Abstract

In sophisticated CMP recipes, the material removal may be accomplished on the basis of a chemically reactive slurry material and a reduced down force, wherein the surface topography of a finally obtained material layer may be enhanced by using, at least in a final phase, a glazed state of the polishing pad.

Claims

1. A method of planarizing a metal-containing layer formed above a substrate of a semiconductor device, the method comprising:

removing material of said metal by performing a polishing process by establishing a relative motion between a polishing pad and said substrate;

supplying a chemically reactive slurry so as to enhance a removal rate for said metal; and

controlling said removal rate by conditioning said polishing pad so as to maintain a surface of said polishing pad in a glazed state at least in a final phase of said polishing process.

2. The method of claim 1, wherein said polishing pad is conditioned so as to maintain said glazed state throughout the entire polishing process.

3. The method of claim 1, wherein said polishing pad is conditioned so as to maintain said glazed state in a final phase of said polishing process.

4. The method of claim 1, further comprising exposing a dielectric material during said polishing process, wherein said dielectric material has embedded therein metal regions comprised of said metal.

5. The method of claim 4, wherein said polishing process comprises a first polishing phase performed on the basis of a first removal rate and a second polishing phase performed on the basis of a second reduced removal rate.

6. The method of claim 5, wherein said first polishing phase is performed by applying an increased degree of conditioning compared to said second polishing phase.

7. The method of claim 5, further comprising removing at least a portion of said metal in said first phase of said polishing process by using a different polishing pad.

8. The method of claim 4, wherein said metal-containing layer is planarized by using said polishing pad as the only polishing pad.

9. The method of claim 1, wherein said metal-containing layer represents a metallization layer of a metallization system of said semiconductor device.

10. The method of claim 9, wherein said metallization system comprises a low-k dielectric material.

11. A method, comprising:

removing a metal material from a dielectric layer of a microstructure device by performing a first polishing process in the presence of a slurry that chemically reacts with said metal material, said first polishing process having a first removal rate for said metal material;

controlling a degree of conditioning of a polishing pad in a second polishing process so as to maintain said polishing pad in a glazed state, said glazed state resulting in a second removal rate that is approximately 70 percent or less of said first removal rate of said first polishing process; and

performing said second polishing process on the basis of said glazed state so as to expose surface portions of said dielectric layer.

12. The method of claim 11, further comprising establishing a non-glazed state of a polishing pad of said first polishing process.

13. The method of claim 11, wherein said first and second polishing processes are performed by using the same polishing pad.

14. The method of claim 11, wherein said metal material comprises copper.

15. The method of claim 14, wherein said dielectric layer comprises a low-k dielectric material.

16. The method of claim 11, wherein said glazed state of said polishing pad is established so as to result in said second removal rate that is approximately 50 percent or less of said first removal rate.

17. The method of claim 11, wherein a value of at least one process parameter is the same in said first and second polishing processes.

18. The method of claim 17, wherein said at least one process parameter is a down force applied during said first and second polishing processes.

19. The method of claim 11, wherein said second polishing process is performed in the presence of said slurry.

20. A method of planarizing a metallization layer of a microstructure device formed above a substrate, the method comprising:

removing excess metal of said metallization layer in a first polishing phase of a polishing process, said first polishing phase being performed on the basis of a predetermined relative speed between a polishing pad and said substrate and a predetermined down force applied to said substrate;

exposing a dielectric material of said metallization layer in a second phase of said polishing process; and

maintaining a degree of pad glazing at approximately 15 percent or more at least during said second polishing phase.

21. The method of claim 20, wherein said degree of pad glazing is maintained in said first and second polishing phases.

22. The method of claim 20, wherein said first and second polishing phases are performed by using the same polishing pad.

23. The method of claim 20, wherein said predetermined relative speed and down force are applied in said second polishing phase.

24. The method of claim 20, wherein said degree of pad glazing is maintained by controlling a conditioning of a polishing surface of said polishing pad.

25. The method of claim 20, wherein said degree of pad glazing is maintained at approximately 18 percent or higher.