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PLASMA RESISTANT COATINGS FOR PLASMA CHAMBER COMPONENTS

  • US 20100119843A1
  • Filed: 11/10/2008
  • Published: 05/13/2010
  • Est. Priority Date: 11/10/2008
  • Status: Active Grant
First Claim
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1. A component of a plasma processing chamber, comprising:

  • a substrate; and

    a plasma resistant coating disposed over at least a portion of the substrate, wherein the plasma resistant coating comprises a ceramic non-native to the substrate and having a porosity below 1%.

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