PLASMA RESISTANT COATINGS FOR PLASMA CHAMBER COMPONENTS
First Claim
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1. A component of a plasma processing chamber, comprising:
- a substrate; and
a plasma resistant coating disposed over at least a portion of the substrate, wherein the plasma resistant coating comprises a ceramic non-native to the substrate and having a porosity below 1%.
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Abstract
Plasma resistant coating materials, plasma resistant coatings and methods of forming such coatings on hardware components. In one embodiment, hardware component is an electrostatic chuck (ESC) and the plasma resistant coating is formed on a surface of the ESC. The plasma resistant coatings are formed by methods other than thermal spraying to provide plasma resistant coatings having advantageous material properties.
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Citations
25 Claims
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1. A component of a plasma processing chamber, comprising:
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a substrate; and a plasma resistant coating disposed over at least a portion of the substrate, wherein the plasma resistant coating comprises a ceramic non-native to the substrate and having a porosity below 1%. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10)
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11. A method of forming a plasma resistant coating for a plasma chamber component, comprising:
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providing a substrate; and forming the plasma resistant coating over the substrate under conditions which expose the plasma resistant coating to energetic particles having a diameter less than approximately 1 μ
m as the coating is formed. - View Dependent Claims (12, 13, 14, 15, 16, 17, 18, 19, 20)
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21. A method of forming a plasma resistant coating on a plasma chamber component, comprising:
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providing a component substrate; and forming the plasma resistant coating over the component substrate with a nanoparticle mass flow deposition process. - View Dependent Claims (22, 23, 24, 25)
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Specification