PATTERN SELECTION FOR LITHOGRAPHIC MODEL CALIBRATION
First Claim
1. A method of test pattern selection for computational lithography model calibration, comprising:
- identifying a pool of candidate test patterns;
identifying a set of lithography model parameters; and
automatically selecting a set of test patterns from the pool of candidate test patterns that are most effective in determining optimal values of the identified model parameters.
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Abstract
The present invention relates generally to methods and apparatuses for test pattern selection for computational lithography model calibration. According to some aspects, the pattern selection algorithms of the present invention can be applied to any existing pool of candidate test patterns. According to some aspects, the present invention automatically selects those test patterns that are most effective in determining the optimal model parameter values from an existing pool of candidate test patterns, as opposed to designing optimal patterns. According to additional aspects, the selected set of test patterns according to the invention is able to excite all the known physics and chemistry in the model formulation, making sure that the wafer data for the test patterns can drive the model calibration to the optimal parameter values that realize the upper bound of prediction accuracy imposed by the model formulation.
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Citations
21 Claims
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1. A method of test pattern selection for computational lithography model calibration, comprising:
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identifying a pool of candidate test patterns;
identifying a set of lithography model parameters; andautomatically selecting a set of test patterns from the pool of candidate test patterns that are most effective in determining optimal values of the identified model parameters. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10)
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11. A method of test pattern selection for computational lithography model calibration, comprising:
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preparing a sensitivity matrix corresponding to a pool of candidate test patterns and a set of model parameters; performing calculations using the sensitivity matrix; and selecting a set of test patterns from the pool of candidate test patterns based on the calculations. - View Dependent Claims (12, 13, 14)
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15. A method of test pattern selection for computational lithography model calibration, comprising:
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developing a sensitivity matrix that corresponds to a cost function associated with accuracy of a lithography model, wherein the sensitivity matrix establishes a relationship between a pool of candidate test patterns and a set of parameters of the lithography model; and selecting a set of test patterns from the pool of candidate test patterns by performing calculations on the sensitivity matrix. - View Dependent Claims (16, 17, 18, 19, 20)
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21. A computer program product comprising one or more computer-readable storage media having computer-executable instructions for causing a computer to select test patterns for calibrating a computational lithography model, the instructions causing the computer to perform a method comprising:
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identifying a pool of candidate test patterns; identifying a set of lithography model parameters; and automatically selecting a set of test patterns from the pool of candidate test patterns that are most effective in determining optimal values of the identified model parameters.
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Specification