LASER ABLATION TOOLING VIA SPARSE PATTERNED MASKS

• US 20100129617A1
• Filed: 11/21/2008
• Published: 05/27/2010
• Est. Priority Date: 11/21/2008
• Status: Abandoned Application

• Current Assignee: 3M Innovative Properties Company (3M Company)
• Original Assignee: 3M Innovative Properties Company (3M Company)
• Inventors: Corrigan, Thomas R.
• Application Number:
  US12/275,669
• Publication Number:
  US 20100129617A1
• Time in Patent Office: Days
• US Class Current: 428/195.100
• CPC Class Codes: B23K 26/066 by using masks
• CPC Class Codes: G03F 1/20 Masks or mask blanks for imaging by charged particle beam [CPB] radiation, e.g. by electron beam; Preparation thereof
• CPC Class Codes: G03F 1/70 Adapting basic layout or design of masks to lithographic process requirements, e.g., second iteration correction of mask patterns for imaging
• CPC Class Codes: G03F 7/24 Curved surfaces G03F7/70 takes precedence
• CPC Class Codes: Y10T 428/24802 Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.]

Abstract

A sparse patterned mask for use in a laser ablation process to image a substrate. The mask has a plurality of apertures for transmission of light and non-transmissive areas around the apertures. The apertures individually form a portion of a complete pattern, and a plurality of apertures from one or more masks together form the complete pattern when the masks are imaged. Making a mask sparse provides for a path to remove debris from the substrate during the laser ablation process. Multiple interlaced sparse repeating patterns can create a more complex pattern with repeat distances larger than the individual patterns.

Claims

1. A sparse patterned mask for use in imaging a laser onto a substrate, comprising:

a mask having apertures for transmission of light and non-transmissive areas around the apertures, wherein the apertures individually form a portion of a complete pattern, and wherein at least a portion of the non-transmissive areas exist on the mask in regions between the apertures that correspond to non-imaged regions on the substrate that are subsequently imaged by the apertures to create the complete pattern.

2. The mask of claim 1, wherein the substrate has a substantially flat shape.

3. The mask of claim 1, wherein the substrate has a substantially cylindrical shape.

4. The mask of claim 1, wherein each of the plurality of apertures are arranged on portions of a regular repeating array.

5. The mask of claim 1, wherein the complete pattern includes continuous features.

6. The mask of claim 1, wherein the complete pattern includes discrete features.

7. The mask of claim 1, wherein the apertures have a circular shape.

8. The mask of claim 1, wherein the apertures have a hexagonal shape.

9. The mask of claim 1, wherein the mask comprises a single mask having the plurality of apertures forming the complete pattern when the single mask is imaged a plurality of times onto the substrate.

10. The mask of claim 1, wherein the mask comprises one of a plurality of masks to be imaged onto the substrate to create the complete pattern.

11. The mask of claim 1, wherein the mask is configured for use in a laser ablation system to image the laser onto the substrate.

12. A method for laser imaging a substrate using a sparse patterned mask, comprising:

imaging the substrate through a first mask having apertures for transmission of light and non-transmissive areas around the apertures, wherein the apertures in the first mask form a first portion of a complete pattern; and

imaging the substrate through one or more second masks each having apertures for transmission of light and non-transmissive areas around the apertures, wherein the apertures in the second mask form a second portion of the complete pattern,

wherein the first mask and the one or more second masks together form the complete pattern when the first mask and the one or more second masks are individually imaged onto the substrate.

13. The method of claim 12, wherein the substrate has a substantially flat shape.

14. The method of claim 12, wherein the substrate has a substantially cylindrical shape.

15. The method of claim 12, wherein the apertures in the first mask and the one or more second masks each form a subset of the apertures in the complete pattern.

16. The method of claim 15, wherein the subset of the apertures are arranged in a matrix.

17. The method of claim 12, wherein the complete pattern has a repeat distance that is greater than a repeat distance of a pattern in any of the first mask and the one or more second masks.

18. The method of claim 12, wherein the imaging steps include using the laser image to ablate a surface of the substrate.

19. A method for laser imaging a substrate using a sparse patterned mask, comprising:

imaging the substrate through first apertures for transmission of light, wherein non-transmissive areas surround the first apertures and wherein the first apertures in the mask form a first portion of a complete pattern; and

imaging the substrate through one or more second apertures for transmission of light, wherein the non-transmissive areas surround the one or more second apertures and wherein the one or more second apertures in the mask form a second portion of the complete pattern,

wherein the first apertures and the one or more second apertures together form the complete pattern when the first apertures and the one or more second apertures are individually imaged onto the substrate.

20. The method of claim 19, wherein the first apertures and the one or more second apertures are imaged at the same time.

21. The method of claim 19, wherein the substrate has a substantially flat shape.

22. The method of claim 19, wherein the substrate has a substantially cylindrical shape.

23. The method of claim 19, wherein the imaging steps comprise:

imaging the substrate through the first apertures at a first position of the mask; and

imaging the substrate through the one or more second apertures at a second position of the mask different from the first position.

24. The method of claim 19, wherein the imaging steps include using the laser image to ablate a surface of the substrate.

25. A method of generating a patterned cylindrical tool, comprising:

forming a first portion of a complete pattern in a surface of a cylindrical substrate, the first portion comprising a first plurality of discrete rows; and

forming a second portion of the complete pattern in the surface of the cylindrical substrate, the second portion comprising a second plurality of discrete rows interlaced with the first plurality of discrete rows,

wherein the first and second portions together form the complete pattern.

26. The method of claim 25, wherein the forming steps each comprising using laser ablation to form the first and second portions.

27. The method of claim 25, wherein the substrate comprises a polymeric material.

28. A method of generating a patterned cylindrical tool, comprising:

forming a first portion of a complete pattern in a surface of a cylindrical substrate along a first helical path; and

forming a second portion of the complete pattern in the surface of the cylindrical substrate along a second helical path,

wherein the second portion is interlaced with the first portion and wherein the first and second portions together form the complete pattern.

29. The method of claim 28, wherein the forming steps each comprising using laser ablation to form the first and second portions.

30. The method of claim 28, wherein the substrate comprises a polymeric material.

31. A microreplicated article comprising:

two or more repeating arrays of features, each of the arrays of features forming a constituent pattern as part of a complete pattern, that are interlaced to create the complete pattern, wherein the complete pattern of the features repeats over a distance greater than a repeat distance of any of the constituent patterns.

32. A patterned cylindrical tool, comprising:

a first portion of a complete pattern of features in a surface of a cylindrical substrate, the first portion comprising a first plurality of discrete rows of features; and

a second portion of the complete pattern of features in the surface of the cylindrical substrate, the second portion comprising a second plurality of discrete rows of features interlaced with the first plurality of discrete rows,

wherein the first and second portions each form a constituent pattern of the complete pattern, the first and second portions together form the complete pattern of features, and the complete pattern repeats over a distance greater than a repeat distance of any of the constituent patterns.

33. A patterned cylindrical tool, comprising:

a first portion of a complete pattern of features in a surface of a cylindrical substrate along a first helical path; and

a second portion of the complete pattern of features in the surface of the cylindrical substrate along a second helical path,

wherein the first and second portions each form a constituent pattern of the complete pattern, the second portion is interlaced with the first portion, the first and second portions together form the complete pattern of features, and the complete pattern repeats over a distance greater than a repeat distance of any of the constituent patterns.

34. A flat patterned tool comprising:

two or more repeating arrays of features on a substantially flat substrate, each of the arrays of features forming a constituent pattern as part of a complete pattern, that are interlaced to create the complete pattern of features, wherein the complete pattern repeats over a distance greater than a repeat distance of any of the constituent patterns.