Exposure apparatus, method for cleaning member thereof, maintenance method for exposure apparatus, maintenance device, and method for producing device
First Claim
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1. A lithographic projection apparatus, comprising:
- a projection system configured to project a beam of radiation onto a substrate;
a substrate table configured to hold a substrate;
a liquid retrieval system configured to retrieve liquid from a space between the projection system and the substrate table;
wherein the substrate table comprises, on a surface facing the projection system, a reflector configured to reflect a cleaning beam of radiation projected through the projection system onto an underside of the liquid retrieval system.
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Abstract
An exposure apparatus forms an immersion area of a liquid on the side of the image plane of a projection optical system and performs exposure of a substrate via the projection optical system and the liquid of the immersion region. The exposure apparatus has an optical cleaning unit which irradiates a predetermined irradiation light, having an optical cleaning effect, onto, for example, the upper surface of the substrate stage which makes contact with the liquid for forming the immersion area. Thus, it is possible to prevent deterioration of the exposure accuracy and measurement accuracy due to pollution of the member in contact with the liquid in the immersion region.
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Citations
25 Claims
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1. A lithographic projection apparatus, comprising:
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a projection system configured to project a beam of radiation onto a substrate; a substrate table configured to hold a substrate; a liquid retrieval system configured to retrieve liquid from a space between the projection system and the substrate table; wherein the substrate table comprises, on a surface facing the projection system, a reflector configured to reflect a cleaning beam of radiation projected through the projection system onto an underside of the liquid retrieval system. - View Dependent Claims (2, 3, 4, 5, 6, 7)
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8. A reflective member for positioning under a projection system of an immersion lithographic projection apparatus, the reflective member comprising:
- a first facet configured to reflect incoming radiation projected through a projection system of the lithographic apparatus to a second facet of the reflective member, which second facet is configured to reflect radiation reflected by the first facet back in a direction with at least a major component in the direction of the incoming radiation.
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9. A reflective member sized for positioning in a recess for a substrate of a substrate table of an immersion lithographic apparatus.
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10. A method of irradiating the underside of a liquid supply system positioned around an end of a projection system in an immersion lithographic apparatus, the method comprising:
positioning a reflector under the projection system such that a cleaning beam of radiation projected through the projection system onto the reflector is reflected onto an underside of the liquid supply system. - View Dependent Claims (11, 12, 13, 14, 15, 16, 17, 18, 19, 20, 21, 22, 23, 24)
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25. A method of cleaning the underside of a liquid supply system comprising providing liquid consisting of ultra-pure water and one of (a) a mixture of hydrogen peroxide and ozone, (b) hydrogen peroxide at a concentration of up to 5%, (c) ozone at a concentration of up to 50 ppm, and (d) oxygen at concentration of up to 10 ppm to the underside and irradiating the underside by reflecting a cleaning beam of radiation projected through a projection system from a reflector onto the underside.
Specification