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Plasma Processing Apparatus And Plasma Processing Method

  • US 20100140224A1
  • Filed: 02/22/2010
  • Published: 06/10/2010
  • Est. Priority Date: 03/16/1995
  • Status: Abandoned Application
First Claim
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1. A plasma processing apparatus including a vacuum processing chamber, a plasma generating unit for generating a plasma in the vacuum processing chamber, a process gas supply unit for supplying gas to the vacuum process chamber, a metallic specimen table having a specimen holding surface for holding a specimen to be processed, and a vacuum pumping unit for evacuating the vacuum processing chamber;

  • wherein the metallic specimen table comprises;

    electrostatic means for holding the specimen on a holding surface of the metallic specimen table by electrostatic force;

    a specimen table cover made of an insulator arranged in an upper portion of the metallic specimen table on an outer portion of the specimen holding surface so as to cover at least a part of an upper surface of the metallic specimen table disposed at a position facing and below the specimen for preventing discharge of undesired metals when the metallic specimen table is exposed to the plasma;

    a first heat transfer gas supply unit having a main path inside of the metallic specimen table for supplying a heat transfer gas between the specimen holding surface and the specimen for cooling the specimen; and

    a second heat transfer gas supply unit having a branch path formed inside of the metallic specimen table and branched from the main path inside of the metallic specimen table of the first heat transfer gas supply unit for supplying a part of the heat transfer gas from the main path directly to a closed gap between an outer portion of the upper surface of the specimen holding surface and the specimen table cover for cooling the specimen table cover.

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