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DISSIMILAR MATERIAL RETENTION

  • US 20100140530A1
  • Filed: 12/09/2008
  • Published: 06/10/2010
  • Est. Priority Date: 12/09/2008
  • Status: Abandoned Application
First Claim
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1. A method of designing an interference fit assembly, the method comprising:

  • designing a geometric layout of a first piece, a second piece, and a third piece, wherein said first piece is in contact with and encloses at least a portion of said second piece, and wherein said second piece is in contact with and encloses at least a portion of said third piece;

    selecting, for said first piece, a first material with a known CTE;

    selecting, for said second piece, a second material with an equal or higher CTE than said first material; and

    selecting said first and second material such that the material properties are not exceeded during operation over an operational temperature range.

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