Substrate holder, stage apparatus, and exposure apparatus with first support part provided in a suction space and second support part

• US 20100141924A1
• Filed: 01/14/2010
• Published: 06/10/2010
• Est. Priority Date: 09/01/2004
• Status: Active Grant

• Current Assignee: Nikon Corporation
• Original Assignee: Nikon Corporation
• Inventors: Shibazaki, Yuichi
• Granted Patent: US 8,717,543 B2
• Time in Patent Office: Days
• US Class Current: 355/72
• CPC Class Codes: G03F 7/707 Chucks, e.g. chucking or un-chucking operations or structural details
• CPC Class Codes: H01L 21/6838 with gripping and holding devices using a vacuum; Bernoulli devices
• CPC Class Codes: H01L 21/6875 characterised by a plurality of individual support members, e.g. support posts or protrusions

Abstract

An object of the invention is to hold a substrate with satisfactory flatness, even at a circumferential edge part that surrounds a suction space. The invention is equipped with a circumferential edge part that surrounds a suction space, and a first support part that is provided in the suction space and that supports a substrate. Furthermore, the invention is equipped with a second support part that extends from the circumferential edge part to the first support part and that supports the substrate.

Claims

1. A substrate holder comprising:

a circumferential edge part that surrounds a suction space;

a first support part that is provided in the suction space and that supports a substrate;

second support parts that support the substrate, wherein

each of the second support parts has a first end that is positioned at the circumferential edge part and a second end that is positioned adjacent to the first support part, and

the second ends of the second support parts do not substantially line up linearly or accurately.

2. A substrate holder according to claim 1, wherein

each of the second support parts has substantially linear shape from the circumferential edge part toward the first support part and not beyond an area in which the first support part is provided.

3. A substrate holder according to claim 1, wherein

a support surface area whereon the substrate is supported by each one of the second support parts is larger a support surface area whereon the substrate is supported by the first support part.

4. A substrate holder according to any one of claim 1, wherein

a plurality of the first support parts is provided.

5. A substrate holder according to any one of claim 1, wherein

the first support parts constitutes a pin chuck.

6. A substrate holder according to any one of claim 1, wherein

at least one of the first support part and the second support parts is given water repellency treatment.

7. A substrate holder according to any one of claim 1, wherein

the second support parts are made of a ceramic material.

8. A substrate holder according to any one of claim 1, wherein

the second support parts are radially provided.

9. A substrate holder according to any one of claim 1, wherein

the circumferential edge part and the second support parts are formed integrally.

10. A substrate holder according to claim 1, wherein

the height of the first support part is the same as the height of the second support parts.

11. A substrate holder according to claim 9, wherein

the height of the first and second support parts is the same as the height of the circumferential edge part.

12. A stage apparatus that holds and moves a substrate, comprising:

a substrate holder, which serves as a substrate holder that holds the substrate, according to any one of claim 1.

13. A stage apparatus according to claim 12, wherein

a reflecting part is provided to an end surface of the substrate holder.

14. An exposure apparatus that uses a stage apparatus to expose a substrate with a pattern, wherein

a stage apparatus according to claim 12 is used as the stage apparatus.

15. An exposure apparatus according to claim 14, wherein

exposure is performed in a state wherein a liquid is filled between the substrate and a projection optical system, which projects the pattern onto the substrate.

16. A method for holding a substrate comprising:

surrounding a suction space with a circumferential edge part;

supporting a substrate with a first support part that is provided in the suction space; and

supporting the substrate with second support parts, wherein

each of the second support parts has a first end that is positioned at the circumferential edge part and a second end that is positioned adjacent to the first support part, and

the second ends of the second support parts do not substantially line up linearly or accurately.

17. The method for holding a substrate according to claim 16, wherein

a support surface area whereon the substrate is supported by each one of the second support parts is larger than a support surface area whereon the substrate is supported by the first support part.