Systems and Methods of Laser Texturing of Material Surfaces and their Applications
First Claim
1. A method for texturing a surface of a material, comprising:
- providing a gaseous or vacuum environment in an area around the surface of the material;
irradiating a portion of the surface with short laser pulses; and
moving at least one of the surface or a laser beam relative to each other to allow the short laser pulses to irradiate the surface;
wherein the method produces a periodic array of pillars or a non-periodic array of pillars on the surface, resulting in changes in properties of the surface.
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Abstract
The surface of a material is textured and by exposing the surface to pulses from an ultrafast laser. The laser treatment causes pillars to form on the treated surface. These pillars provide for greater light absorption. Texturing and crystallization can be carried out as a single step process. The crystallization of the material provides for higher electric conductivity and changes in optical and electronic properties of the material. The method may be performed in vacuum or a gaseous environment. The gaseous environment may aid in texturing and/or modifying physical and chemical properties of the surfaces. This method may be used on various material surfaces, such as semiconductors, metals and their alloys, ceramics, polymers, glasses, composites, as well as crystalline, nanocrystalline, polycrystalline, microcrystalline, and amorphous phases.
117 Citations
122 Claims
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1. A method for texturing a surface of a material, comprising:
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providing a gaseous or vacuum environment in an area around the surface of the material; irradiating a portion of the surface with short laser pulses; and moving at least one of the surface or a laser beam relative to each other to allow the short laser pulses to irradiate the surface; wherein the method produces a periodic array of pillars or a non-periodic array of pillars on the surface, resulting in changes in properties of the surface. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20, 21, 22, 23, 24, 25, 26, 27, 28, 30, 31, 32, 33, 34, 68, 69, 70, 71, 72, 73, 74, 75, 76, 77, 78, 79, 80, 81, 82, 83, 84, 85, 86, 87, 88, 89, 90, 91, 92, 93, 103, 104)
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29. The method of claim 29, further comprising sharpening the nanospikes by at least one of chemical etching or ion etching, or any combination thereof after irradiating the surface.
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35. A method for texturing a surface of a semiconductor material, comprising:
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providing a gaseous or vacuum environment in an area around the surface of the material; irradiating a portion of the surface with short laser pulses while simultaneously crystallizing the portion of the surface; and moving at least one of the surface and a laser beam relative to each other to allow the short laser pulses to irradiate another portion of the surface while simultaneously crystallizing the other portion of the surface; wherein the method produces pillars on the surface, resulting in changes in properties of the surface.
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36. A method for texturing a metallic surface, comprising:
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irradiating a portion of the metallic surface with short laser pulses; and moving at least one of the surface and a laser beam relative to each other to allow the short laser pulses to irradiate another portion of the surface; wherein the method produces pillars on the surface, resulting in changes in properties of the surface. - View Dependent Claims (37, 38, 39, 40, 41, 42, 43, 44, 45, 46, 47, 48, 49, 50, 51, 52, 53, 54, 55, 56, 57, 58, 59, 60, 61, 62, 63, 64, 65, 66, 67)
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94. A semiconductor surface, comprising a portion on which pillars are formed with nanospikes atop the pillars by irradiating the surface with short laser pulses in a vacuum or gaseous environment surrounding the surface.
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95. A metallic surface, comprising a portion on which pillars are formed by irradiating the surface with short laser pulses.
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96. A system for texturing a surface of a material comprising:
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a chamber in an area around the surface of the material to provide a gaseous or vacuum environment; an energy source providing a power supply for a radiation source, said radiation source for irradiating at least a portion of the surface; a base for retaining said surface, said base or radiation source adapted to move relative to one another for irradiation wherein a periodic array of pillars or a non-periodic array of pillars on the surface, resulting in changes in properties of the surface. - View Dependent Claims (97, 98, 99, 100, 120)
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101. A system for texturing a surface of a material comprising:
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a chamber in an area around the surface of the material to provide a gaseous or vacuum environment; an energy source providing a power supply for a radiation source, said radiation source for irradiating at least a portion of the surface; and a base for retaining said surface, said base or radiation source adapted to move relative to one another for irradiation wherein the portion of the surface is crystallized during irradiation.
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102. A system for texturing a surface of a material comprising:
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a chamber in an area around the surface of the material to provide a gaseous or vacuum environment; an energy source providing a power supply for a radiation source, said radiation source for irradiating at least a portion of the surface; and a base for retaining said surface, said base or radiation source adapted to move relative to one another for irradiation wherein pillars are produces on said portion of the surface, resulting in changes in properties of the surface
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105. A surface, comprising a portion on which pillars are formed with nanospikes atop the pillars by irradiating the surface with short laser pulses in a vacuum or gaseous environment surrounding the surface, wherein said surface comprises at least one of metal, metal alloys, ceramic, glasses or polymer, or any combination thereof.
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106. A surface, comprising a portion on which pillars are formed by irradiating the surface with short laser pulses, wherein said surface comprises at least one of metal alloys, semiconductor, ceramic, glasses or polymer, or any combination thereof.
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107. A method for texturing a surface of a material, comprising:
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providing a gaseous or vacuum environment in an area around the surface of the material; irradiating a portion of the surface with energy pulses; and moving at least one of the surface or an energy beam relative to each other to allow the energy pulses to irradiate the surface; wherein the method produces a periodic array of pillars or a non-periodic array of pillars on the surface, resulting in changes in properties of the surface. - View Dependent Claims (108, 109)
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110. A method for texturing a surface of a semiconductor material, comprising:
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providing a gaseous or vacuum environment in an area around the surface of the material; irradiating a portion of the surface with energy pulses while simultaneously crystallizing the portion of the surface; and moving at least one of the surface and an energy beam relative to each other to allow the short energy pulses to irradiate another portion of the surface while simultaneously crystallizing the other portion of the surface; and wherein the method produces pillars on the surface, resulting in changes in properties of the surface. - View Dependent Claims (111, 112)
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113. A method for texturing a metallic surface, comprising:
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irradiating a portion of the metallic surface with energy pulses; and moving at least one of the surface and an energy beam relative to each other to allow the energy pulses to irradiate another portion of the surface; wherein the method produces pillars on the surface, resulting in changes in properties of the surface. - View Dependent Claims (114, 115)
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- 116. A surface, comprising a portion on which pillars are formed with nanospikes atop the pillars by irradiating the surface with energy pulses in a vacuum or gaseous environment surrounding the surface, wherein said surface comprises at least one of metal, metal alloys, ceramic, semiconductor glasses or polymer, or any combination thereof.
- 118. A surface, comprising a portion on which pillars are formed by irradiating the surface with energy pulses, wherein said surface comprises at least one of metal, metal alloys, semiconductor, ceramic, glasses or polymer, or any combination thereof.
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121. A method for producing a structure or texture, said method comprising:
controlling laser texturing process and/or crystallizing process by varying the spatial profile of the laser pulse.
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122. A method for producing a structure or texture, said method comprising:
controlling surface texture and/or crystallization by preheating the sample and providing additional energy by the laser beam.
Specification