×

METHODS AND SYSTEM FOR MODEL-BASED GENERIC MATCHING AND TUNING

  • US 20100146475A1
  • Filed: 11/05/2009
  • Published: 06/10/2010
  • Est. Priority Date: 11/10/2008
  • Status: Active Grant
First Claim
Patent Images

1. A method of tuning a to-be-tuned lithographic process to a reference lithographic process, comprising:

  • obtaining respective lithographic process models for both the reference lithographic process and the to-be-tuned lithographic process;

    identifying a set of tunable parameters of the to-be-tuned lithographic process, wherein the tunable parameters are distinct and independent from patterns to be imaged using the to-be-tuned lithographic process;

    determining responses of the to-be-tuned lithographic process model to changes in the set of tunable parameters;

    determining optimal changes in the tunable parameters that cause the lithographic process models to match; and

    adjusting the model for the to-be-tuned lithographic process based on the determined optimal changes.

View all claims
  • 2 Assignments
Timeline View
Assignment View
    ×
    ×