MODELING MASK CORNER ROUNDING EFFECTS USING MULTIPLE MASK LAYERS

• US 20100146476A1
• Filed: 02/18/2010
• Published: 06/10/2010
• Est. Priority Date: 09/28/2007
• Status: Active Grant

• Current Assignee: Synopsys Incorporated
• Original Assignee: Synopsys Incorporated
• Inventors: Huang, Jensheng, Melvin, Lawrence S. III, Kuo, Chun-chieh
• Granted Patent: US 7,853,919 B2
• Time in Patent Office: Days
• US Class Current: 716/51
• CPC Class Codes: G03F 1/36 Masks having proximity correction features; Preparation thereof, e.g. optical proximity correction [OPC] design processes
• CPC Class Codes: G03F 7/70441 Optical proximity correction [OPC]
• CPC Class Codes: G03F 7/705 Modelling or simulating from physical phenomena up to complete wafer processes or whole workflow in wafer productions
• CPC Class Codes: G03F 7/70675 Latent image, i.e. measuring the image of the exposed resist prior to development

Abstract

An embodiment provides systems and techniques for determining an improved process model which models mask corner rounding (MCR) effects. During operation, the system may receive a mask layout and process data which was generated by applying a photolithography process to the mask layout. The system may also receive an uncalibrated process model which may contain a set of MCR components. Next, the system may identify a set of corners in the mask layout. The system may then determine a set of mask layers, wherein at least some of the mask layers correspond to the MCR components. Next, the system may determine an improved process model by calibrating the uncalibrated process model using the set of mask layers, and the process data.

Claims

1. A computer-executed method for determining a process model which models mask corner rounding effects, the method comprising:

receiving a mask layout;

receiving process data which was generated by applying a photolithography process to the mask layout;

receiving an uncalibrated process model which includes;

an optical component; and

a set of mask-corner-rounding (MCR) components, wherein

each MCR component is designed to model MCR effects;

identifying a set of corners in the mask layout;

determining a set of mask layers which includes;

a first mask layer which includes substantially all patterns in the mask layout; and

a set of MCR mask layers, wherein substantially all patterns in each MCR mask layer relate to patterns in the mask layout that are in proximity to the set of corners, and wherein each MCR mask layer is associated with an MCR component; and

using one or more computers to calibrate the uncalibrated process model using the set of mask layers and the process data.

2. The computer-executed method of claim 1, wherein the set of MCR components includes:

an inner-corner component for modeling MCR effects of inner corners; and

an outer-corner component for modeling MCR effects of outer corners.

3. The computer-executed method of claim 1, wherein the set of MCR mask layers includes:

an inner-corner mask layer, wherein substantially all shapes in the inner-corner mask layer relate to patterns in the mask layout that are in proximity to inner corners; and

an outer-corner mask layer, wherein substantially all shapes in the outer-corner mask layer relate to patterns in the mask layout that are in proximity to outer corners.

4. The computer-executed method of claim 3, wherein the inner-corner mask layer includes bevel shapes which correspond to inner corners in the set of corners in the mask layout, and wherein the outer-corner mask layer includes bevel shapes which correspond to outer corners in the set of corners in the mask layout.

5. The computer-executed method of claim 3, wherein the inner-corner mask layer includes notch shapes which correspond to inner corners in the set of corners in the mask layout, and wherein the outer-corner mask layer includes notch shapes which correspond to outer corners in the set of corners in the mask layout.

6. The computer-executed method of claim 3, wherein the inner-corner mask layer includes shapes of a first type which correspond to inner corners in the set of corners in the mask layout, and wherein the outer-corner mask layer includes shapes of a second type which correspond to outer corners in the set of corners in the mask layout, wherein the shapes of the first type are different from the shapes of the second type.

7. The computer-executed method of claim 1, wherein calibrating the process model includes:

convolving the optical component with the first mask layer; and

convolving each MCR component with the associated MCR mask layer.

8. A computer-readable storage device storing instructions that when executed by a computer cause the computer to perform a method for determining a process model which models mask corner rounding effects, the method comprising:

receiving a mask layout;

receiving process data which was generated by applying a photolithography process to the mask layout;

receiving an uncalibrated process model which includes;

an optical component; and

a set of mask-corner-rounding (MCR) components, wherein

each MCR component is designed to model MCR effects;

identifying a set of corners in the mask layout;

determining a set of mask layers which includes;

a first mask layer which includes substantially all patterns in the mask layout; and

a set of MCR mask layers, wherein substantially all patterns in each MCR mask layer relate to patterns in the mask layout that are in proximity to the set of corners, and wherein each MCR mask layer is associated with an MCR component; and

calibrating the uncalibrated process model using the set of mask layers and the process data.

9. The computer-readable storage device of claim 8, wherein the set of MCR components includes:

an inner-corner component for modeling MCR effects of inner corners; and

an outer-corner component for modeling MCR effects of outer corners.

10. The computer-readable storage device of claim 8, wherein the set of MCR mask layers includes:

an inner-corner mask layer, wherein substantially all shapes in the inner-corner mask layer relate to patterns in the mask layout that are in proximity to inner corners; and

an outer-corner mask layer, wherein substantially all shapes in the outer-corner mask layer relate to patterns in the mask layout that are in proximity to outer corners.

11. The computer-readable storage device of claim 10, wherein the inner-corner mask layer includes bevel shapes which correspond to inner corners in the set of corners in the mask layout, and wherein the outer-corner mask layer includes bevel shapes which correspond to outer corners in the set of corners in the mask layout.

12. The computer-readable storage device of claim 10, wherein the inner-corner mask layer includes notch shapes which correspond to inner corners in the set of corners in the mask layout, and wherein the outer-corner mask layer includes notch shapes which correspond to outer corners in the set of corners in the mask layout.

13. The computer-readable storage device of claim 10, wherein the inner-corner mask layer includes shapes of a first type which correspond to inner corners in the set of corners in the mask layout, and wherein the outer-corner mask layer includes shapes of a second type which correspond to outer corners in the set of corners in the mask layout, wherein the shapes of the first type are different from the shapes of the second type.

14. The computer-readable storage device of claim 8, wherein calibrating the process model includes:

convolving the optical component with the first mask layer; and

convolving each MCR component with the associated MCR mask layer.

15. An apparatus for determining a process model which models mask corner rounding effects, comprising:

a processor; and

a memory storing instructions that when executed by the processor cause the system to determine a process model which models mask corner rounding effects, the instructions comprising;

instructions for receiving a mask layout;

instructions for receiving process data which was generated by applying a photolithography process to the mask layout;

instructions for receiving an uncalibrated process model which includes;

an optical component; and

a set of mask-corner-rounding (MCR) components, wherein each MCR component is designed to model MCR effects;

instructions for identifying a set of corners in the mask layout;

instructions for determining a set of mask layers which includes;

a first mask layer which includes substantially all patterns in the mask layout; and

a set of MCR mask layers, wherein substantially all patterns in each MCR mask layer relate to patterns in the mask layout that are in proximity to the set of corners, and wherein each MCR mask layer is associated with an MCR component; and

instructions for calibrating the uncalibrated process model using the set of mask layers and the process data.

16. The apparatus of claim 15, wherein the set of MCR components includes:

an inner-corner component for modeling MCR effects of inner corners; and

an outer-corner component for modeling MCR effects of outer corners.

17. The apparatus of claim 15, wherein the set of MCR mask layers includes:

an inner-corner mask layer, wherein substantially all shapes in the inner-corner mask layer relate to patterns in the mask layout that are in proximity to inner corners; and

an outer-corner mask layer, wherein substantially all shapes in the outer-corner mask layer relate to patterns in the mask layout that are in proximity to outer corners.

18. The apparatus of claim 17, wherein the inner-corner mask layer includes bevel shapes which correspond to inner corners in the set of corners in the mask layout, and wherein the outer-corner mask layer includes bevel shapes which correspond to outer corners in the set of corners in the mask layout.

19. The apparatus of claim 17, wherein the inner-corner mask layer includes notch shapes which correspond to inner corners in the set of corners in the mask layout, and wherein the outer-corner mask layer includes notch shapes which correspond to outer corners in the set of corners in the mask layout.

20. The apparatus of claim 17, wherein the inner-corner mask layer includes shapes of a first type which correspond to inner corners in the set of corners in the mask layout, and wherein the outer-corner mask layer includes shapes of a second type which correspond to outer corners in the set of corners in the mask layout, wherein the shapes of the first type are different from the shapes of the second type.

21. The apparatus of claim 15, wherein the instructions for calibrating the process model includes:

instructions for convolving the optical component with the first mask layer; and

instructions for convolving each MCR component with the associated MCR mask layer.