Multiple-Substrate Transfer Apparatus and Multiple-Substrate Processing Apparatus
First Claim
Patent Images
1. A multiple-substrate processing apparatus comprising:
- a reaction chamber comprised of two discrete reaction stations for simultaneously processing two substrates, said reaction stations being aligned along a substrate-loading/unloading direction;
a transfer chamber disposed underneath the reaction chamber, for loading and unloading substrates to and from the reaction stations;
a load lock chamber disposed next to the transfer chamber, said load lock chamber being provided with a transfer arm for loading and unloading substrates to and from the transfer chamber, said transfer arm comprising one or more end-effectors for simultaneously supporting two substrates one behind the other as viewed in the substrate-loading/unloading direction; and
a transfer robot disposed in the vicinity of the load lock chamber, for loading and unloading substrates to and from the transfer arm.
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Abstract
A multiple-substrate processing apparatus includes: a reaction chamber comprised of two discrete reaction stations aligned one behind the other for simultaneously processing two substrates; a transfer chamber disposed underneath the reaction chamber, for loading and unloading substrates to and from the reaction stations simultaneously; and a load lock chamber disposed next to the transfer chamber. The transfer arm includes one or more end-effectors for simultaneously supporting two substrates one behind the other as viewed in the substrate-loading/unloading direction.
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Citations
14 Claims
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1. A multiple-substrate processing apparatus comprising:
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a reaction chamber comprised of two discrete reaction stations for simultaneously processing two substrates, said reaction stations being aligned along a substrate-loading/unloading direction; a transfer chamber disposed underneath the reaction chamber, for loading and unloading substrates to and from the reaction stations; a load lock chamber disposed next to the transfer chamber, said load lock chamber being provided with a transfer arm for loading and unloading substrates to and from the transfer chamber, said transfer arm comprising one or more end-effectors for simultaneously supporting two substrates one behind the other as viewed in the substrate-loading/unloading direction; and a transfer robot disposed in the vicinity of the load lock chamber, for loading and unloading substrates to and from the transfer arm. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12)
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13. A method for controlling exhaust flow in a multiple-substrate processing apparatus comprising:
- (i) a reaction chamber comprised of two discrete reaction stations for simultaneously processing two substrates, said reaction stations being aligned one behind the other as viewed in a substrate-loading/unloading direction;
(ii) a transfer chamber disposed underneath the reaction chamber, for loading and unloading substrates to and from the reaction stations;
(iii) a load lock chamber disposed next to the transfer chamber, said load lock chamber being provided with a transfer arm for loading and unloading substrates to and from the transfer chamber, said transfer arm comprising one or more end-effectors for simultaneously supporting two substrates one behind the other as viewed in the substrate-loading/unloading direction; and
(iv) a transfer robot disposed in the vicinity of the load lock chamber, for loading and unloading substrates to and from the transfer arm, wherein an exhaust port is provided in the reaction chamber above a substrate processing level at which substrates are placed for treatment, and an exhaust port is provided in the transfer chamber below the substrate processing level, said method comprising;evacuating both the reaction chamber and the transfer chamber selectively through the exhaust port of the transfer chamber rather than through the exhaust port of the reaction chamber, when substrates are in the transfer chamber; evacuating the reaction chamber selectively through the exhaust port of the reaction chamber rather than through the exhaust port of the transfer chamber, while introducing a purge gas into the transfer chamber, when substrates are in the reaction chamber for processing; and evacuating the reaction chamber predominantly or wholly through the exhaust port of the reaction chamber rather than through the exhaust port of the transfer chamber, when the reaction chamber is subjected to cleaning. - View Dependent Claims (14)
- (i) a reaction chamber comprised of two discrete reaction stations for simultaneously processing two substrates, said reaction stations being aligned one behind the other as viewed in a substrate-loading/unloading direction;
Specification