SUPPORT STRUCTURE FOR MEMS DEVICE AND METHODS THEREFOR
First Claim
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1. A method of making a microelectromechanical systems device, comprising:
- providing a substrate having a first electrode layer formed thereon;
depositing a sacrificial layer over the first electrode layer;
forming at least one annular hole in the sacrificial layer;
filling the annular hole;
depositing a second electrode layer over the sacrificial layer after filling the annular hole; and
removing the sacrificial layer outside annular hole after depositing the second electrode layer.
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Abstract
A microelectromechanical systems device having support structures formed of sacrificial material surrounded by a protective material. The microelectromechanical systems device includes a substrate having an electrode formed thereon. Another electrode is separated from the first electrode by a cavity and forms a movable layer, which is supported by support structures formed of a sacrificial material.
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Citations
7 Claims
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1. A method of making a microelectromechanical systems device, comprising:
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providing a substrate having a first electrode layer formed thereon; depositing a sacrificial layer over the first electrode layer; forming at least one annular hole in the sacrificial layer; filling the annular hole; depositing a second electrode layer over the sacrificial layer after filling the annular hole; and removing the sacrificial layer outside annular hole after depositing the second electrode layer. - View Dependent Claims (2, 3, 4, 5, 6, 7)
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Specification