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ILLUMINATION DEVICE OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS, AND MICROLITHOGRAPHIC PROJECTION EXPOSURE METHOD

  • US 20100149504A1
  • Filed: 12/15/2009
  • Published: 06/17/2010
  • Est. Priority Date: 12/17/2008
  • Status: Abandoned Application
First Claim
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1. An illumination device of a microlithographic projection exposure apparatus, comprising:

  • a deflection device configured to variably deflect at least two light beams impinging on the deflection device independently of one another by variation of the deflection angle in each case in such a way that each of said light beams are directed onto at least one location in a pupil plane of the illumination device via at least two different beam paths,wherein, on said beam paths, at least one optical property of the respective light beam is influenced differently relative to the beam paths.

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