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E-BEAM DEFECT REVIEW SYSTEM

  • US 20100150429A1
  • Filed: 12/15/2008
  • Published: 06/17/2010
  • Est. Priority Date: 12/15/2008
  • Status: Active Grant
First Claim
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1. An apparatus comprises:

  • an imaging unit to image the patent to be reviewed, wherein imaging unit is the modified SORIL column;

    a focusing sub-system to do micro-focusing due to the wafer surface topology, wherein the focusing sub-system verifies the position of the grating image reflecting from wafer surface to adjust the focus;

    a surface charge control to regulate the charge accumulation due to electron irradiation during the review process, wherein the gaseous molecules are injected under the flood gun beam rather than under the primary beam;

    a storage unit for storing wafer design database; and

    a host computer to manage defect locating, defect sampling, and defect classifying, wherein the host computer and storage database are linked by high speed network.

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