E-BEAM DEFECT REVIEW SYSTEM
First Claim
1. An apparatus comprises:
- an imaging unit to image the patent to be reviewed, wherein imaging unit is the modified SORIL column;
a focusing sub-system to do micro-focusing due to the wafer surface topology, wherein the focusing sub-system verifies the position of the grating image reflecting from wafer surface to adjust the focus;
a surface charge control to regulate the charge accumulation due to electron irradiation during the review process, wherein the gaseous molecules are injected under the flood gun beam rather than under the primary beam;
a storage unit for storing wafer design database; and
a host computer to manage defect locating, defect sampling, and defect classifying, wherein the host computer and storage database are linked by high speed network.
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Abstract
The present invention relates to a defect review system, and/or particularly, to an apparatus and method of defect review sampling, review method and classification on a semiconductor wafer or a pattern lithography reticle during integrated circuit fabrication. These objects are achieved in comparing a reviewed image with a reference image pick-up through a smart sampling filter. A clustering computer system base on high speed network will provide data cache and save operation time and memory. A smart review sampling filter automatically relocate abnormal pattern or defects and classify the device location extracted from design database and/or from golden die image on the same substrate. The column of the present defect review system is comprised of the modified SORIL type objective lens. This column provides solution of improving throughput during sample review, material identification better image quality, and topography image of defect. One embodiment of the present invent adopts an optical auto focusing system to compromise micro height variation due wafer surface topography. And another embodiment adopts surface charge control system to regulate the charge accumulation due to electron irradiation during the review process.
108 Citations
5 Claims
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1. An apparatus comprises:
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an imaging unit to image the patent to be reviewed, wherein imaging unit is the modified SORIL column; a focusing sub-system to do micro-focusing due to the wafer surface topology, wherein the focusing sub-system verifies the position of the grating image reflecting from wafer surface to adjust the focus; a surface charge control to regulate the charge accumulation due to electron irradiation during the review process, wherein the gaseous molecules are injected under the flood gun beam rather than under the primary beam; a storage unit for storing wafer design database; and a host computer to manage defect locating, defect sampling, and defect classifying, wherein the host computer and storage database are linked by high speed network. - View Dependent Claims (2)
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3. A system for automatic defects review on semiconductor integrated circles wafer comprising:
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an imaging unit to image the patent to be reviewed, wherein imaging unit is the modified SORIL column; a focusing sub-system to do micro-focusing due to the wafer surface topology, wherein the focusing sub-system verifies the position of the grating image reflecting from wafer surface to adjust the focus; a surface charge control to regulate the charge accumulation due to electron irradiation during the review process, wherein the gaseous molecules are injected under the flood gun beam rather than under the primary beam; a storage unit for storing wafer design database; and a host computer to manage defect locating, defect sampling, and defect classifying, wherein the host computer and storage database are linked by high speed network. - View Dependent Claims (4, 5)
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Specification