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System for Contactless Cleaning, Lithographic Apparatus and Device Manufacturing Method

  • US 20100151394A1
  • Filed: 09/25/2009
  • Published: 06/17/2010
  • Est. Priority Date: 09/29/2008
  • Status: Abandoned Application
First Claim
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1. A system for contactless removal of a particle from a surface of an object, comprising:

  • a source of plasma constructed to generate He plasma in a vicinity of the surface; and

    a control unit constructed to modify plasma parameters to cause an increased generation of He metastables in the He plasma without affecting the source of plasma.

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