ILLUMINATION SYSTEM FOR ILLUMINATING A MASK IN A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS
First Claim
Patent Images
1. A system, comprising:
- an objective having an object plane, a pupil surface and an image plane in which a mask can be arranged;
a beam deflection array comprising deflection elements,wherein each beam deflection element is adapted to deflect an impinging light ray by a deflection angle that is variable in response to a control signal, the beam deflection elements are arranged in or in close proximity to the object plane of the objective, and the system is an illumination system for a scanning microlithographic projection exposure apparatus.
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Abstract
An illumination system for illuminating a mask in a scanning microlithographic projection exposure apparatus has an objective with an object plane, at least one pupil surface and an image plane in which a mask can be arranged. A beam deflection array of reflective or transparent beam deflection elements is provided, where each beam deflection element is adapted to deflect an impinging light ray by a deflection angle that is variable in response to a control signal. The beam deflection elements are arranged in or in close proximity to the object plane of the objective.
29 Citations
27 Claims
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1. A system, comprising:
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an objective having an object plane, a pupil surface and an image plane in which a mask can be arranged; a beam deflection array comprising deflection elements, wherein each beam deflection element is adapted to deflect an impinging light ray by a deflection angle that is variable in response to a control signal, the beam deflection elements are arranged in or in close proximity to the object plane of the objective, and the system is an illumination system for a scanning microlithographic projection exposure apparatus. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20, 21, 22, 23, 24, 25, 26)
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27. An apparatus, comprising:
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an illumination system, comprising; an objective having an object plane, a pupil surface and an image plane in which a mask can be arranged; and a beam deflection array comprising reflective or transparent beam deflection elements, each beam deflection element being adapted to deflect an impinging light ray by a deflection angle that is variable in response to a control signal, and the beam deflection elements being arranged in or in close proximity to the object plane of the objective; and a projection objective configured to image the mask onto a light sensitive layer, wherein the apparatus is a microlithographic projection exposure apparatus.
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Specification