PROCESS FOR MANUFACTURING POLISHING PAD

• US 20100162631A1
• Filed: 05/15/2008
• Published: 07/01/2010
• Est. Priority Date: 05/31/2007
• Status: Active Grant

• Current Assignee: ROHM and HAAS Electronic Materials CMP Holdings Incorporated (DuPont de Nemours, Inc.)
• Original Assignee: TOYO Tire & Rubber Company Limited (Toyo Tire Corporation)
• Inventors: Fukuda, Takeshi, Hirose, Junji, Nakamura, Kenji, Sato, Akinori, Doura, Masato
• Granted Patent: US 8,409,308 B2
• Time in Patent Office: Days
• US Class Current: 51/295
• CPC Class Codes: B24B 37/205 provided with a window for inspecting the surface of the work being lapped
• CPC Class Codes: B24D 18/00 Manufacture of grinding tools or other grinding devices, e.g. wheels, not otherwise provided for
• CPC Class Codes: Y10T 428/24322 Composite web or sheet
• CPC Class Codes: Y10T 428/24331 including nonapertured component
• CPC Class Codes: Y10T 428/24364 with transparent or protective coating

Abstract

A method for manufacturing a polishing pad that has a high level of optical detection accuracy and is prevented from causing slurry leak from between the polishing region and the light-transmitting region includes preparing a cell-dispersed urethane composition by a mechanical foaming method; placing a light-transmitting region at a predetermined position on a face material or a belt conveyor, continuously discharging the cell-dispersed urethane composition onto a part of the face material or the belt conveyor where the light-transmitting region is not placed; placing another face material or belt conveyor on the discharged cell-dispersed urethane composition; curing the cell-dispersed urethane composition to form a polishing region including a polyurethane foam, so that a polishing sheet is prepared; applying a coating composition containing an aliphatic and/or alicyclic polyisocyanate to one side of the polishing sheet and curing the coating composition to form a water-impermeable film; and cutting the polishing sheet.

Claims

1. A method for manufacturing a polishing pad, comprising the steps of:

preparing a cell-dispersed urethane composition by a mechanical foaming method;

placing a light-transmitting region at a predetermined position on a face material or a belt conveyor, while feeding or moving the face material or the belt conveyor;

continuously discharging the cell-dispersed urethane composition onto a part of the face material or the belt conveyor where the light-transmitting region is not placed;

placing another face material or belt conveyor on the discharged cell-dispersed urethane composition;

curing the cell-dispersed urethane composition to form a polishing region comprising a polyurethane foam, while its thickness is controlled to be uniform, so that a polishing sheet is prepared;

applying a polyurethane resin coating composition containing an aliphatic and/or alicyclic polyisocyanate to one side of the polishing sheet and curing the polyurethane resin coating composition to form a water-impermeable film; and

cutting the polishing sheet.

2. The method of claim 1, wherein the water-impermeable film has a thickness of 20 μ

m to 100 μ

m.