REFLECTIVE TFT SUBSTRATE AND METHOD FOR MANUFACTURING REFLECTIVE TFT SUBSTRATE
First Claim
1. A reflective TFT substrate comprising:
- a substrate;
a gate electrode and a gate wire formed above the substrate;
a gate insulating film formed above the substrate, the gate electrode and the gate wire;
an oxide layer formed above the gate electrode, and above the gate insulating film;
a metal layer formed above the oxide layer with a channel part interposed therebetween; and
a pixel electrode which contacts a source/drain electrode, whereinthe metal layer functions at least as the pixel electrode and the source/drain electrode which contacts the pixel electrode.
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Abstract
A reflective TFT substrate which can be operated for a prolonged period of time due to the presence of a protective insulating film, is free from occurrence of crosstalk, and is capable of significantly reducing manufacturing cost by decreasing the production steps in the production process. A reflective TFT substrate 1 comprises a substrate 10; a gate electrode 23 and a gate wire 24; a gate insulating film 30; an n-type oxide semiconductor layer 40; a metal layer 60 formed with a channel part 41 interposed therebetween; and a protective insulating film 80 which covers the upper part of the glass substrate 10 on which a pixel electrode 67, a drain wire pad 68 and a gate wire pad 25 are exposed, wherein the metal layer 60 functions at least as a source wire 65, a drain wire 66, a source electrode 63, a drain electrode 64 and the pixel electrode 67.
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Citations
13 Claims
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1. A reflective TFT substrate comprising:
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a substrate; a gate electrode and a gate wire formed above the substrate; a gate insulating film formed above the substrate, the gate electrode and the gate wire; an oxide layer formed above the gate electrode, and above the gate insulating film; a metal layer formed above the oxide layer with a channel part interposed therebetween; and a pixel electrode which contacts a source/drain electrode, wherein the metal layer functions at least as the pixel electrode and the source/drain electrode which contacts the pixel electrode. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9)
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10. A method for producing a reflective TFT substrate comprising the steps of:
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forming a gate electrode and a gate wire above a substrate by using a first mask; stacking a gate insulating film, an oxide layer, a metal layer and a second resist above the substrate, the gate electrode and the gate wire, and forming the second resist into a predetermined shape by half-tone exposure; patterning the metal layer and the oxide layer by an etching method using the second resist to form a source wire, a drain wire and a pixel electrode; after reforming the second resist, selectively patterning the metal layer above the gate electrode by an etching method using the reformed second resist to form a source electrode and a drain electrode; stacking a protective insulating film and a third resist above the gate insulating film and the oxide layer, which are exposed, as well as above the source wire, the drain wire, the source electrode, the drain electrode and the pixel electrode, and forming the third resist into a predetermined shape by using a third mask; and patterning the protective insulating film above the pixel electrode and a source/drain wire pad, as well as the protective insulating film and the gate insulating film above a gate wire pad by an etching method using the third resist to expose the pixel electrode, the source/drain wire pad and the gate wire pad. - View Dependent Claims (11, 12, 13)
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Specification