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EUV Mask Inspection

  • US 20100165310A1
  • Filed: 10/21/2009
  • Published: 07/01/2010
  • Est. Priority Date: 12/31/2008
  • Status: Abandoned Application
First Claim
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1. A system, comprising:

  • an array of sensors configured to produce analog data corresponding to received optical energy; and

    an optical system configured to direct extreme ultra-violet (EUV) light from an inspection area of an EUV patterning device onto the array of sensors;

    whereby the analog data is used to determine defects or to compensate for irregularities found on the EUV mask.

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