OMNI-DIRECTIONAL REFLECTOR AND LIGHT EMITTING DIODE ADOPTING THE SAME

• US 20100166983A1
• Filed: 03/10/2010
• Published: 07/01/2010
• Est. Priority Date: 08/03/2005
• Status: Abandoned Application

• Current Assignee: Samsung Electronics Co. Ltd.
• Original Assignee: Rensselaer Polytechnic Institute, Samsung Electro-Mechanics Co., Ltd. (Samsung Group)
• Inventors: Park, Yong-jo, Xi, Jing-gun, CHO, Jae-hee, Schubert, E. Fred, Kim, Jong-kyu, Sone, Cheol-soo
• Application Number:
  US12/721,132
• Publication Number:
  US 20100166983A1
• Time in Patent Office: Days
• US Class Current: 427/596
• CPC Class Codes: B82Y 20/00 Nanooptics, e.g. quantum optics or photonic crystals
• CPC Class Codes: H01L 33/32 containing nitrogen
• CPC Class Codes: H01L 33/405 Reflective materials
• CPC Class Codes: H01L 33/42 Transparent materials
• CPC Class Codes: H01L 33/46 Reflective coating, e.g. dielectric Bragg reflector

Abstract

An omni-directional reflector having a transparent conductive low-index layer formed of conductive nanorods and a light emitting diode utilizing the omni-directional reflector are provided. The omni-directional reflector includes: a transparent conductive low-index layer formed of conductive nanorods; and a reflective layer formed of a metal.

Claims

1. A method of manufacturing an omni-directional reflector, the method comprising:

providing a reflective layer; and

forming a transparent conductive low-index layer on one surface of the reflective layer and including a plurality of conductive nanorods having a light transmission characteristic and electric conductivity and inclined to form a predetermined oblique angle with respect to the reflective layer, the plurality of conductive nanorods having gaps therebetween filled with air to have a smaller refractive index than that of the plurality of conductive nanorods,

wherein the plurality of conductive nanorods are deposited on the reflective layer in an oblique direction, and a self-shadow area that a material randomly deposited in an early stage does not allow a subsequently deposited material to reach is formed in the depositing of the conductive nanorods.

2. The method of claim 1, wherein, in the depositing of the conductive nanorods, an incidence angle of deposition flux is different from an angle by which the conductive nanorods are inclined with respect to the reflective layer.

3. The method of claim 2, wherein, on the basis of a normal line to the one surface of the reflective layer, the incidence angle of the deposition flux is greater than the angle by which the conductive nanorods are inclined with respect to the reflective layer.

4. The method of claim 1, wherein the conductive nanorods have a single refractive index.

5. The method of claim 1, wherein the conductive nanorods are formed of TCO or TCN.

6. The method of claim 1, wherein the transparent conductive low-index layer has a thickness in proportion to a ¼

wavelength of light.

7. The method of claim 1, wherein the depositing of the conductive nanorods are performed by using sputtering or electronic beams.