Drying furnace for cated film

• US 20100167224A1
• Filed: 08/22/2005
• Published: 07/01/2010
• Est. Priority Date: 08/24/2004
• Status: Active Grant

• Current Assignee: Kabushiki Kaisha Ishiihyoki
• Original Assignee: Kabushiki Kaisha Ishihyoki
• Inventors: Nakano, Teruyuki, Kozawa, Yasuhiro
• Granted Patent: US 8,167,611 B2
• Time in Patent Office: Days
• US Class Current: 432/246
• CPC Class Codes: F26B 25/004 in the shape of discrete sheets wicket conveyors F26B15/085
• CPC Class Codes: F26B 9/06 in stationary drums or chambers
• CPC Class Codes: H01L 21/67034 for drying
• CPC Class Codes: H01L 21/67109 mainly by convection
• CPC Class Codes: Y10S 414/135 Associated with semiconductor wafer handling

Abstract

In drying of a glass substrate to which a coated film is applied, the heating and drying is conducted while feeding means 10, 18, which always moves on a lower surface of the glass substrate 6 to which the coated film is applied, abuts against the substrate, in order to solve a problem that when the lower surface of the coated film is supported for a long time, supporting traces occur and thereby quality of the glass substrate is reduced. With this configuration, traces of the pin 11, 12, 21 are less likely to occur.

Claims

1. A drying furnace for a coated film heating up a substrate of which upper surface is provided with a coated film and drying the coated film, the drying furnace comprising:

a carrier port of the substrate which is formed on a side surface;

heating means which heats and dries the coated film of the substrate; and

feeding means which abuts against a lower surface of the substrate and moves an abutment position against the substrate during heating and drying of the coated film.

2. The drying furnace for the coated film of claim 1, wherein the heating means is a pair of upper and lower hot plate heaters sandwiching the substrate.

4. The drying furnace for the coated film of claim 1, wherein the feeding means is formed of a supporting pin which supports the lower surface of the substrate carried in from the carrier port;

and a moving pin which moves vertically from a lower location to a higher location than the supporting pin by driving means and moves horizontally.

5. The drying furnace for the coated film of claim 2, wherein the feeding means is formed of a supporting pin which supports the lower surface of the substrate carried in from the carrier port;

and a moving pin which moves vertically from a lower location to a higher location than the supporting pin by driving means and moves horizontally.

7. The drying furnace for the coated film of claim 1, wherein the feeding means is formed of a plurality of rotators and pins radially protruding from the rotators and abutting against the lower surface of the substrate, and an interval of the pins is arranged such that the pins always abut against the lower surface of the substrate when the rotators rotate.

8. The drying furnace for the coated film of claim 2, wherein the feeding means is formed of a plurality of rotators and pins radially protruding from the rotators and abutting against the lower surface of the substrate, and

an interval of the pins is arranged such that the pins always abut against the lower surface of the substrate when the rotators rotate.

3. A drying furnace for a coated film heating up a substrate of which upper surface is provided with a coated film and drying the coated film, wherein

hot plate heaters are sequentially arranged in an order of hot plate heater, substrate and hot plate heater such that the substrate is sandwiched by the hot plate heaters, and

a carrier port of the substrate and feeding means are provided between upper and lower hot plate heaters, the feeding means abutting against a lower surface of a glass substrate and moving an abutment position against the substrate at heating and drying of the coated film.

6. The drying furnace for the coated film of claim 3, wherein the feeding means is formed of a supporting pin which supports the lower surface of the substrate carried in from the carrier port;

and a moving pin which moves vertically from a lower location to a higher location than the supporting pin by driving means and moves horizontally.

9. The drying furnace for the coated film of claim 3, wherein the feeding means is formed of a plurality of rotators and pins radially protruding from the rotators and abutting against the lower surface of the substrate, and

an interval of the pins is arranged such that the pins always abut against the lower surface of the substrate when the rotators rotate.