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Negative ion generating hat

  • US 20100170025A1
  • Filed: 06/30/2009
  • Published: 07/08/2010
  • Est. Priority Date: 01/08/2009
  • Status: Abandoned Application
First Claim
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1. A negative ion generating hat 1, which has a stretch band 2 mounted on a lower band of the inner surface,wherein the hat 1 is configured in such a way that an inner 11 of the hat 1 and the band 2 are connected by first and second stitch lines 21 and 22 extending in parallel with each other, respectively, adjacent to upper and lower ends of the band 2, and a predetermined space portion 23 is formed between the band 2 and the inner 11 by means of the first and second stitch lines 21 and 22;

  • anda strip-shaped negative ion generating fabric 3 is inserted into the space portion 23, at least two portions, including both opposite ends of the negative ion generating fabric 3, are fastened to the band 2 by means of a third stitch line 24, and one or more foldable portion 31 is formed by folding the negative ion generating fabric 3 so that the foldable portion 31 is unfolded when the band 2 stretches.

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