Negative ion generating hat
First Claim
1. A negative ion generating hat 1, which has a stretch band 2 mounted on a lower band of the inner surface,wherein the hat 1 is configured in such a way that an inner 11 of the hat 1 and the band 2 are connected by first and second stitch lines 21 and 22 extending in parallel with each other, respectively, adjacent to upper and lower ends of the band 2, and a predetermined space portion 23 is formed between the band 2 and the inner 11 by means of the first and second stitch lines 21 and 22;
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1 Assignment
0 Petitions
Accused Products
Abstract
A negative ion generating hat is provided. The hat is configured in a way that a predetermined space portion is formed between an inner of the hat and a lower band of the inner surface and a negative ion generating fabric is inserted into the space portion, thereby preventing a negative ion generating coating from being easily stripped off in spite of a stretching or creasing of a band.
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Citations
2 Claims
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1. A negative ion generating hat 1, which has a stretch band 2 mounted on a lower band of the inner surface,
wherein the hat 1 is configured in such a way that an inner 11 of the hat 1 and the band 2 are connected by first and second stitch lines 21 and 22 extending in parallel with each other, respectively, adjacent to upper and lower ends of the band 2, and a predetermined space portion 23 is formed between the band 2 and the inner 11 by means of the first and second stitch lines 21 and 22; - and
a strip-shaped negative ion generating fabric 3 is inserted into the space portion 23, at least two portions, including both opposite ends of the negative ion generating fabric 3, are fastened to the band 2 by means of a third stitch line 24, and one or more foldable portion 31 is formed by folding the negative ion generating fabric 3 so that the foldable portion 31 is unfolded when the band 2 stretches. - View Dependent Claims (2)
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Specification