Projection exposure apparatus, projection exposure method, and method for producing device
First Claim
Patent Images
1. A projection exposure apparatus which transfers a pattern formed on a mask onto a substrate through a liquid, the projection exposure apparatus comprising:
- an optical member which projects an image of the pattern onto the substrate; and
an electricity removal device which removes electricity from the liquid to be supplied to a space between the optical member and a surface of the substrate by adding an additive to the liquid to suppress the liquid from being charged.
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Abstract
A projection exposure apparatus transfers a pattern formed on a mask onto a substrate through a liquid. The projection exposure apparatus includes an optical member which projects an image of the pattern onto the substrate and an electricity removal device which removes electricity from the liquid to be supplied to a space between the optical member and a surface of the substrate by adding an additive to the liquid to suppress the liquid from being charged.
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Citations
7 Claims
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1. A projection exposure apparatus which transfers a pattern formed on a mask onto a substrate through a liquid, the projection exposure apparatus comprising:
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an optical member which projects an image of the pattern onto the substrate; and an electricity removal device which removes electricity from the liquid to be supplied to a space between the optical member and a surface of the substrate by adding an additive to the liquid to suppress the liquid from being charged.
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2. A projection exposure apparatus which transfers a pattern formed on a mask onto a substrate through a liquid, the projection exposure apparatus comprising:
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an optical member which projects an image of the pattern onto the substrate; and an electricity removal device which removes electricity from the liquid intervened between the optical member and a surface of the substrate by adding an additive to the liquid to suppress the liquid from being charged.
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3. An exposure method for exposing a substrate with a pattern formed on a mask through a liquid and an optical member, the exposure method comprising:
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adding an additive to the liquid to suppress the liquid from being charged; supplying the liquid to a space between the optical member and a surface of the substrate; and irradiating the mask with an exposure light beam. - View Dependent Claims (4, 5, 6, 7)
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Specification