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PHOTOMASK WITH DETECTOR FOR OPTIMIZING AN INTEGRATED CIRUCIT PRODUCTION PROCESS AND METHOD OF MANUFACTURING AN INTEGRATED CIRCUIT USING THE SAME

  • US 20100174393A1
  • Filed: 03/19/2010
  • Published: 07/08/2010
  • Est. Priority Date: 04/20/2007
  • Status: Active Grant
First Claim
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1. A method of integrated circuit production comprising the steps of:

  • providing a photomask with circuitry in the integrated circuit production process;

    monitoring a process parameter of the integrated circuit production using the photomask; and

    analyzing the monitored process parameter using the photomask.

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